Using neutral atoms and standing light waves to form a calibration artifact for length metrology

被引:10
|
作者
Thywissen, JH [1 ]
Johnson, KS [1 ]
Dekker, NH [1 ]
Chu, AP [1 ]
Prentiss, M [1 ]
机构
[1] Harvard Univ, Dept Phys, Cambridge, MA 02138 USA
来源
关键词
D O I
10.1116/1.590420
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Beams of neutral metastable atoms can be patterned by spatially dependent deexcitation in a standing wave of laser light. Metastable atoms which hit a substrate transfer their internal energy (10-20 eV) to the surface and activate the formation of a durable carbonaceous resist from a vapor precursor. The resist can be used as an etch mask to transfer patterns into the substrate material. In this work, we report a recent experimental demonstration of this "standing wave quenching" (SWQ) patterning technique. We also present an analysis of the accuracy to which atom lithography and SWQ can form a periodic reference array for length metrology. We find that, with some modification of the experimental setup and parameters, the absolute period across a 1 mm(2) patterned area can be known to one part in 10(6). (C) 1998 American Vacuum Society. [S0734-211X(98)12506-4].
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收藏
页码:3841 / 3845
页数:5
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