Thermal stability of germanium-carbon coatings prepared by a RF plasma enhanced chemical vapor deposition method

被引:5
|
作者
Sousani, F. [1 ]
Jamali, H. [1 ]
Mozafarinia, R. [1 ]
Eshaghi, A. [1 ]
机构
[1] Malek Ashtar Univ Technol, Dept Mat Engn, Esfahan, Iran
关键词
Germanium-carbon; Coating; Thermal stability; Transmittance; THIN-FILMS; MECHANICAL-PROPERTIES; TEMPERATURE; ANTIREFLECTION;
D O I
10.1016/j.infrared.2018.08.006
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
In this work, germanium-carbon coatings were deposited on ZnS substrates by RF plasma enhanced chemical vapor deposition (RF-PECVD) using GeH4 and CH4 as precursors. Thermal stability of coatings were investigated by annealing treatment of samples at different temperatures (200 degrees C, 300 degrees C, 400 degrees C and 500 degrees C for 3 min , an air atmosphere). Then, the samples were characterized by fourier transform infrared (FTIR) spectroscopy, X-ray diffraction (XRD), Raman spectroscopy and field emission scanning electron microscopy (FESEM), methods. With annealing samples at 200 degrees C and 300 degrees C, the optical transmittance was increased by 3% in the wavelength region between 3 and 15 mu m. There was no remarkable change in transmittance with annealing samples at 400 degrees C, except for a slight increase in transmittance at the wavelength region between 8 and 9 mu m and a slight decrease at the wavelength region between 11 and 12 mu m. However, as annealing temperature (T-a) was further increased to 500 degrees C, the coating was partly peeled off from the ZnS substrate, leading to a sharp decrease in the transmittance of coatings in the wavelength range of 8-12 mu m. Annealed coatings at the temperatures of 200, 300 and 400 degrees C exhibited a structure free of pores. However, as T-a was further increased to 500 degrees C, the coatings were disintegrated.
引用
收藏
页码:255 / 259
页数:5
相关论文
共 50 条
  • [41] Thin film characterization of diamond-like carbon films prepared by rf plasma chemical vapor deposition
    Hirakuri, KK
    Minorikawa, T
    Friedbacher, G
    Grasserbauer, M
    THIN SOLID FILMS, 1997, 302 (1-2) : 5 - 11
  • [42] A comparative study on the properties of TiN films prepared by chemical vapor deposition enhanced by rf plasma and by electron cyclotron resonance plasma
    Kim, JS
    Jun, BH
    Lee, EJ
    Hwang, CY
    Lee, WJ
    THIN SOLID FILMS, 1997, 292 (1-2) : 124 - 129
  • [43] STRUCTURAL EVOLUTION DURING THE CRYSTALLIZATION PROCESS OF GERMANIUM FILMS PREPARED BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION
    JIANG, JG
    CHEN, KJ
    FENG, D
    SUN, DY
    THIN SOLID FILMS, 1993, 230 (01) : 7 - 9
  • [44] Effect of Ge Incorporation on Hydrogenated Amorphous Silicon Germanium Thin Films Prepared by Plasma Enhanced Chemical Vapor Deposition
    Yan, Baojun
    Zhao, Lei
    Zhao, Bending
    Chen, Jingwei
    Diao, Hongwei
    Wang, Guanghong
    Wang, Wenjing
    ADVANCED MATERIALS DESIGN AND MECHANICS, 2012, 569 : 27 - 30
  • [45] Effects of annealing on the properties of hermetically carbon-coated optical fibers prepared by plasma enhanced chemical vapor deposition method
    Chen, Shin-Shueh
    Shiue, Sham-Tsong
    Tang, Wei-Cun
    Lin, Hung-Yi
    OPTICAL ENGINEERING, 2007, 46 (03)
  • [46] Fluorinated amorphous carbon films prepared by plasma enhanced chemical vapor deposition for solar cell applications
    Valentini, L
    Salerni, V
    Armentano, I
    Kenny, JM
    Lozzi, L
    Santucci, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2003, 21 (05): : 1784 - 1790
  • [47] Influence of temperature on the hydrogenated amorphous carbon films prepared by plasma-enhanced chemical vapor deposition
    Wu, Jiung
    Cheng, Yi-Lung
    Shiau, Ming-Kai
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2010, 28 (06): : 1363 - 1365
  • [48] HYDROGENATED AMORPHOUS-CARBON FILMS PREPARED BY PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION
    CHOU, LH
    JOURNAL OF APPLIED PHYSICS, 1992, 72 (05) : 2027 - 2035
  • [49] Growth and microstructures of carbon nanotube films prepared by microwave plasma enhanced chemical vapor deposition process
    Srivastava, Sanjay K.
    Vankar, V. D.
    Kumar, V.
    THIN SOLID FILMS, 2006, 515 (04) : 1552 - 1560
  • [50] Regrowth of carbon nanotube array by microwave plasma-enhanced thermal chemical vapor deposition
    Chiu, Chien-Chao
    Yoshimura, Masamichi
    Ueda, Kazuyuki
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2008, 47 (04) : 1952 - 1955