Plasma etching of DLC films for microfluidic channels

The goal of this work is to study the effect of plasma etching process on the surface properties of diamond-like carbon thin films having in mind the applicability of this material for construction of microfluidic channels. The films were deposited by dc magnetron sputtering onto p-type (100) 3 in. silicon wafers, at a deposition rate of 8 nm/min. The etch processes have been carried out in a RIE reactor with the discharge produced in an atmosphere of oxygen diluted in argon. Oxygen contents varied from 0 to 100% and different values of the power discharge (from 20 up to 150 W) have been applied. The surface roughness and wall profiles were examined by atomic force microscopy and scanning electron microscopy in order to verify the quality of the final surface obtained after etching. (C) 2003 Elsevier Science Ltd. All rights reserved.