Influence of process conditions on the optical properties HfO2/SiO2 thin films for high power laser coatings

被引：6

作者：

Langdon, B. ^{[1
]}

Patel, D. ^{[1
]}

Krous, E. ^{[1
]}

Rocca, J. J. ^{[1
]}

Menoni, C. S. ^{[1
]}

Tomasel, F. ^{[2
,3
]}

Kholi, S. ^{[4
]}

McCurdy, P. R. ^{[4
]}

Langston, Peter ^{[5
]}

Ogloza, Albert ^{[5
]}

机构：

[1] Colorado State Univ, Dept Elect & Comp Engn, Ft Collins, CO 80523 USA

[2] Adv Energy Inc, Ft Collins, CO 80525 USA

[3] Colorado State Univ, Dept Elect & Comp Engn, Ft Collins, CO 80523 USA

[4] Colorado State Univ, Dept Chem, Ft Collins, CO 80523 USA

[5] US Navy, Air Warfare Ctr, China Lake, CA 93555 USA

来源：

LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 2007 | 2008年 / 6720卷

关键词：

dual ion beam sputtering; Hafnia; surface roughness; film morphology; HfO2;

D O I：

10.1117/12.753027

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

We investigate the variations that occur with changes in the number of layers and with the use of the assist beam main and assist beam energy on the morphology of HfO2/SiO2 quarter wave stacks deposited by dual ion beam sputtering. We show how the addition of sequential HfO2/SiO2 bilayers, up to eight, affects the surface roughness and micro-crystallinity of the top HfO2 layer. We also show that use of the assist source significantly smooths the surface while simultaneously reducing microcrystallinity. The HfO2/SiO2 structures are very robust and can withstand fluences in excess of 3 J/cm(2) generated by 1 ps pulses from a chirped amplified Ti: Sapphire laser.

引用

页数：8

共 50 条

[21] Study of mechanism on HfO2/SiO2 multilayer high reflective coatings by pulse YAG laser conditioning
Zhou, Yewei
Xie, Jian
Li, Yude
Zang, Chuanxiang
Jiguang Zazhi/Laser Journal, 2000, 21 (02):
[22] Influence of dry etching on the properties of SiO2 and HfO2 single layers
Xie, Lingyun
Liu, Huasong
Zhao, Jun
Jiao, Hongfei
Zhang, Jinlong
Wang, Zhanshan
Cheng, Xinbin
APPLIED OPTICS, 2020, 59 (05) : A128 - A134
[23] Optical properties of the Al2O3/SiO2 and Al2O3/HfO2/SiO2 antireflective coatings
Marszalek, Konstanty
Winkowski, Pawel
Jaglarz, Janusz
MATERIALS SCIENCE-POLAND, 2014, 32 (01) : 80 - 87
[24] Laser conditioning effect on HfO2/SiO2 film
Wei, Yaowei
Zhang, Zhe
Liu, Hao
Ouyang, Sheng
Zheng, Yi
Tang, Gengyu
Chen, Songlin
Ma, Ping
Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams, 2013, 25 (12): : 3338 - 3342
[25] Optical characterization of HfO2 thin films
Franta, Daniel
Ohlidal, Ivan
Necas, David
Vizda, Frantisek
Caha, Ondrej
Hason, Martin
Pokorny, Pavel
THIN SOLID FILMS, 2011, 519 (18) : 6085 - 6091
[26] Preparation of ultrathin HfO2 films and comparison of HfO2/SiO2/Si interfacial structures
Tan, RQ
Azuma, Y
Fujimoto, T
Fan, JW
Kojima, I
SURFACE AND INTERFACE ANALYSIS, 2004, 36 (08) : 1007 - 1010
[27] Nanostructuring HfO2 Thin Films as Antireflection Coatings
Ni, Jie
Zhu, Yu
Wang, Sihong
Li, Zhengcao
Zhang, Zhengjun
Wei, Bingqing
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 2009, 92 (12) : 3077 - 3080
[28] Effect of SiO2 protective layer on the femtosecond laser-induced damage of HfO2/SiO2 multilayer high-reflective coatings
Yuan, Lei
Zhao, Yuanan
Wang, Congjuan
He, Hongbo
Fan, Zhengxiu
Shao, Jianda
APPLIED SURFACE SCIENCE, 2007, 253 (07) : 3450 - 3454
[29] Contaminant-free layer-by-layer annealing to improve the properties of HfO2/SiO2 optical films for the fs laser
Wu, Yuling
Yu, Jingxia
Li, Xue
Wang, Xiangyu
Tang, Min
Li, Bo
Zu, Xiaotao
Yang, Liang
Xiang, Xia
OPTICS EXPRESS, 2024, 32 (17): : 29301 - 29315
[30] Analysis of laser induced thermal mechanical relationship of HfO2/SiO2 high reflective optical thin film at 1064 nm
Dai, Gang
Chen, Yanbei
Lu, Jian
Shen, Zhonghua
Ni, Xiaowu
CHINESE OPTICS LETTERS, 2009, 7 (07) : 601 - 604

← 1 2 3 4 5 →