Influence of process conditions on the optical properties HfO2/SiO2 thin films for high power laser coatings

被引：6

作者：

Langdon, B. ^{[1
]}

Patel, D. ^{[1
]}

Krous, E. ^{[1
]}

Rocca, J. J. ^{[1
]}

Menoni, C. S. ^{[1
]}

Tomasel, F. ^{[2
,3
]}

Kholi, S. ^{[4
]}

McCurdy, P. R. ^{[4
]}

Langston, Peter ^{[5
]}

Ogloza, Albert ^{[5
]}

机构：

[1] Colorado State Univ, Dept Elect & Comp Engn, Ft Collins, CO 80523 USA

[2] Adv Energy Inc, Ft Collins, CO 80525 USA

[3] Colorado State Univ, Dept Elect & Comp Engn, Ft Collins, CO 80523 USA

[4] Colorado State Univ, Dept Chem, Ft Collins, CO 80523 USA

[5] US Navy, Air Warfare Ctr, China Lake, CA 93555 USA

来源：

LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 2007 | 2008年 / 6720卷

关键词：

dual ion beam sputtering; Hafnia; surface roughness; film morphology; HfO2;

D O I：

10.1117/12.753027

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

We investigate the variations that occur with changes in the number of layers and with the use of the assist beam main and assist beam energy on the morphology of HfO2/SiO2 quarter wave stacks deposited by dual ion beam sputtering. We show how the addition of sequential HfO2/SiO2 bilayers, up to eight, affects the surface roughness and micro-crystallinity of the top HfO2 layer. We also show that use of the assist source significantly smooths the surface while simultaneously reducing microcrystallinity. The HfO2/SiO2 structures are very robust and can withstand fluences in excess of 3 J/cm(2) generated by 1 ps pulses from a chirped amplified Ti: Sapphire laser.

引用

页数：8

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