Sapphire-GaN-based planar integrated free-space optical system

被引：4

作者：

Hofmann, M. ^{[1
]}

Hauguth-Frank, S. ^{[1
]}

Lebedev, V. ^{[2
]}

Ambacher, O. ^{[2
]}

Sinzinger, S. ^{[1
]}

机构：

[1] Tech Univ Ilmenau, Inst Micro & Nanotechnol, D-98684 Ilmenau, Germany

[2] Fraunhofer Inst Appl Solid State Phys, D-79108 Freiburg, Germany

来源：

APPLIED OPTICS | 2008年 / 47卷 / 16期

关键词：

D O I：

10.1364/AO.47.002950

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We report on the design and fabrication of a planar integrated free-space optical system working on the basis of binary phase diffractive optical elements (DOEs) realized in GaN on a sapphire substrate. Group III-nitride/sapphire substrates enable the parallel monolithic integration of passive microoptical elements like lenses and gratings as demonstrated here and optoelectronic devices like light emitters and photodetectors on a single wafer. We present an approach for the simultaneous optimization of the efficiency of transmissive and reflective diffractive optical elements processed in a single lithographic etching step. (C) 2008 Optical Society of America.

引用

页码：2950 / 2955

页数：6

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