Hydrolysis deposition of thin films of antimony-doped tin oxide

被引：6
|
作者：
Tsukuma, K [1 ]
Akiyama, T
Imai, H
机构：
[1] NEDO, New Energy & Ind Technol Dev Org, Ind Technol Div, Tokyo 170, Japan
[2] Tosoh Corp, Res Ctr, Ayase, Kanagawa 252, Japan
[3] Keio Univ, Fac Sci & Technol, Dept Appl Chem, Yokohama, Kanagawa 223, Japan
来源：
JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 2001年 / 84卷 / 04期
关键词：
D O I：
10.1111/j.1151-2916.2001.tb00755.x
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Thin films of antimony-doped tin oxide have been obtained by a new technique, the so-called hydrolysis deposition method, in which hydrolyzed solids are precipitated from metal fluoride solutions. Mixed solutions of SnF3 and SbF3 produce antimony- and fluorine-doped tin oxide films. The amount of antimony can be controlled in a wide range by adjusting the initial fluoride concentrations of the solution. The Film containing 2.9 mol% antimony heated at 500 degreesC has an electrical resistivity of 1.0 x 10(-3) Omega .cm, which is lower than previously obtained by wet-chemical techniques.
引用
收藏
页码：869 / 871
页数：3
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