COMPARATIVE ANALYSIS OF ACCELERATION GRADIENTS FOR CHIP STRUCTURES WITH DIFFERENT REFRACTIVE INDICES

被引：0
|
作者：
Vasyliev, A. V. [1 ]
Bolshov, O. O. [1 ]
Svistunov, O. O. [1 ]
Povrozin, A., I [1 ]
Zaitsev, V. P. [1 ]
Leshchenko, V. P. [1 ]
Sotnikov, G., V [1 ]
机构：
[1] Kharkov Inst Phys & Technol, Natl Sci Ctr, Kharkiv, Ukraine
来源：
PROBLEMS OF ATOMIC SCIENCE AND TECHNOLOGY | 2021年 / 06期
基金：
新加坡国家研究基金会;
关键词：
FEMTOSECOND LASER-ABLATION; OPTICAL-CONSTANTS; FUSED-SILICA; NANOSECOND; ULTRAVIOLET; SAPPHIRE; DAMAGE;
D O I：
10.46813/2021-136-075
中图分类号：
O57 [原子核物理学、高能物理学];
学科分类号：
070202 ;
摘要：
The results of numerical studies of accelerating gradients in accelerators based on dielectric chip structures with different refractive indices, excited by a titanium-sapphire laser pulse, are presented. A comparative analysis of the influence of the refractive index on the rate of acceleration of electron bunches is carried out. Promising materials for the manufacture of dielectric laser accelerators are proposed.
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页码：75 / 79
页数：5
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