Controlled focused electron beam-induced etching for the fabrication of sub-beam-size nanoholes

被引：18

作者：

Miyazoe, Hiroyuki ^{[1
,2
]}

Utke, Ivo ^{[1
]}

Michler, Johann ^{[1
]}

Terashima, Kazuo ^{[2
]}

机构：

[1] EMPA Mat Sci & Technol, Lab Mech & Nanostruct, CH-3602 Bern, Switzerland

[2] Univ Tokyo, Grad Sch Frontier Sci, Kashiwa, Chiba 2778561, Japan

来源：

APPLIED PHYSICS LETTERS | 2008年 / 92卷 / 04期

关键词：

D O I：

10.1063/1.2839334

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Sub-beam-size focused electron beam-induced etching of amorphous carbon membranes was achieved. The size of the tungsten filament generated electron beam was determined from the in situ stage current monitoring and verified by knife edge measurements. The in situ time resolved stage current measurements as an end point detection allowed the fabrication of nanoholes with a diameter of sub-20 nm, corresponding to 20%-40% of the full width at half maximum of the incident beam. (C) 2008 American Institute of Physics.

引用

页数：3

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