Study of bake mechanisms by real-time in-situ ellipsometry

被引：29

作者：

Paniez, PJ ^{[1
]}

Vareille, A ^{[1
]}

Ballet, P ^{[1
]}

Mortini, B ^{[1
]}

机构：

[1] France Telecom, CNET Grenoble, F-38243 Meylan, France

来源：

ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XV, PTS 1 AND 2 | 1998年 / 3333卷

关键词：

resist; polymer; bake; film formation; in-situ ellipsometry; relaxation; compaction;

D O I：

10.1117/12.312418

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Film formation and bake processes have been studied using in-situ ellipsometry. This new experimental set-up based on a HeNe laser mounted over a hot-plate is shown to be mainly sensitive to physical changes in the resist layer and provides real-time monitoring of the modifications induced during bake steps. Pure polymer films as well as DUV 248 nm and 193 nm CA resists are investigated.

引用

页码：289 / 300

页数：4

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