High-volume manufacturing requirements drive EUV source development

被引：0

作者：

Myers, DW ^{[1
]}

Fomenkov, IV ^{[1
]}

Partlo, W ^{[1
]}

Brandt, DC ^{[1
]}

Klene, BC ^{[1
]}

机构：

[1] Cymer Inc, San Diego, CA 92127 USA

来源：

SOLID STATE TECHNOLOGY | 2005年 / 48卷 / 05期

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Extreme-ultraviolet (EUV) light source development has regularly been characterized as one of the critical issues facing the viability of EUV lithography. Output power and operational lifetimes remain top concerns for EUV sources. Industry efforts to date have focused primarily on the technical feasibility of one approach or another, but less emphasis has been placed on the critical issue of commercial feasibility to reach high-volume manufacturing (HVM). This article summarizes the technical viability of discharge-produced plasma (DPP) and laser-produced plasma (LPP) light source concepts when compared to HVM requirements and also describes Cymer's new LPP source development roadmap, which supports introduction of EUV lithography for the 32nm process node.

引用

页码：67 / +

页数：4

共 50 条

[41] Application of HALT and HASS principles in a high-volume manufacturing environment
3Com Corp, Salt Lake City, United States
Qual Reliab Eng Int, 6 (385-392):
[42] Multiple electron beam maskless lithography for high-volume manufacturing
Chen, Jack J. H.
Lin, S. J.
Fang, T. Y.
Chang, S. M.
Krecinic, Faruk
Lin, Burn J.
PROCEEDINGS OF TECHNICAL PROGRAM: 2009 INTERNATIONAL SYMPOSIUM ON VLSI TECHNOLOGY, SYSTEMS AND APPLICATIONS, 2009, : 96 - 97
[43] THE FUTURE OF AUTOMATION FOR HIGH-VOLUME WAFER FABRICATION AND ASIC MANUFACTURING
HUGHES, RA
SHOTT, JD
PROCEEDINGS OF THE IEEE, 1986, 74 (12) : 1775 - 1793
[44] THE FUTURE OF AUTOMATION FOR HIGH-VOLUME WAFER FABRICATION AND ASIC MANUFACTURING
HUGHES, RA
SHOTT, JD
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (8B) : C446 - C446
[45] TOWARDS A MANUFACTURING TECHNOLOGY FOR HIGH-VOLUME PRODUCTION OF COMPOSITE COMPONENTS
RUDD, CD
KENDALL, KN
PROCEEDINGS OF THE INSTITUTION OF MECHANICAL ENGINEERS PART B-JOURNAL OF ENGINEERING MANUFACTURE, 1992, 206 (02) : 77 - 91
[46] The application of HALT and HASS principles in a high-volume manufacturing environment
Prakash, S
QUALITY AND RELIABILITY ENGINEERING INTERNATIONAL, 1998, 14 (06) : 385 - 392
[47] High-Volume Manufacturing of Flexible and Lightweight CIGS Solar Cells
Britt, J. S.
Wiedeman, S.
Schoop, U.
Verebelyi, D.
PVSC: 2008 33RD IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE, VOLS 1-4, 2008, : 2133 - 2136
[48] Development of a high-volume air sampler for nanoparticles
Hata, M.
Thongyen, T.
Bao, L.
Hoshino, A.
Otani, Y.
Ikeda, T.
Furuuchi, M.
ENVIRONMENTAL SCIENCE-PROCESSES & IMPACTS, 2013, 15 (02) : 454 - 462
[49] EUV industrialization High Volume Manufacturing with NXE3400B
Mastenbroek, Marcel
INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2018, 2018, 10809
[50] Open Issues in Mask Technology as EUV Enters High Volume Manufacturing
Preil, Moshe
Westphal, James W.
XXVI SYMPOSIUM ON PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY (PHOTOMASK JAPAN 2019), 2019, 11178

← 1 2 3 4 5 →