High-volume manufacturing requirements drive EUV source development

被引：0

作者：

Myers, DW ^{[1
]}

Fomenkov, IV ^{[1
]}

Partlo, W ^{[1
]}

Brandt, DC ^{[1
]}

Klene, BC ^{[1
]}

机构：

[1] Cymer Inc, San Diego, CA 92127 USA

来源：

SOLID STATE TECHNOLOGY | 2005年 / 48卷 / 05期

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Extreme-ultraviolet (EUV) light source development has regularly been characterized as one of the critical issues facing the viability of EUV lithography. Output power and operational lifetimes remain top concerns for EUV sources. Industry efforts to date have focused primarily on the technical feasibility of one approach or another, but less emphasis has been placed on the critical issue of commercial feasibility to reach high-volume manufacturing (HVM). This article summarizes the technical viability of discharge-produced plasma (DPP) and laser-produced plasma (LPP) light source concepts when compared to HVM requirements and also describes Cymer's new LPP source development roadmap, which supports introduction of EUV lithography for the 32nm process node.

引用

页码：67 / +

页数：4

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