Two-dimensional arrangement of fine silica spheres on self-assembled monolayers

被引：34

作者：

Masuda, Y ^{[1
]}

Seo, WS ^{[1
]}

Koumoto, K ^{[1
]}

机构：

[1] Nagoya Univ, Grad Sch Engn, Dept Appl Chem, Nagoya, Aichi 4648603, Japan

来源：

THIN SOLID FILMS | 2001年 / 382卷 / 1-2期

关键词：

self-assembled monolayer; silica; sphere; micro device; micropatterning;

D O I：

10.1016/S0040-6090(00)01691-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Novel processes to arrange fine silica spheres two-dimensionally on self-assembled monolayers (SAMs) were developed. SiO2 sphere surfaces were modified to have CN groups by the use of trichlorocyanoethylsilane, and CN groups were oxidized to COOH groups with t-BuOK. A SAM of PTCS (phenyltrichlorosilane) was modified to have a phenyl/silanol-group pattern by UV irradiation using a photomask and was used as a template to arrange fine SiO2 spheres. SiO2 spheres were selectively attached to silanol surfaces, possibly forming ester bonds, which enabled the fabrication of micropatterned arrangements of SiO2 spheres. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：183 / 189

页数：7

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