Ion beam nanoscale fabrication and lithography-A review

被引：76
|
作者：
Baglin, J. E. E. [1 ]
机构：
[1] IBM Almaden Res Ctr, San Jose, CA 95120 USA
来源：
APPLIED SURFACE SCIENCE | 2012年 / 258卷 / 09期
关键词：
Nanofabrication; ITRS Roadmap; Self-assembly; Lithography; Focused-ion-beam; Ion-implantation; FILMS; AR+;
D O I：
10.1016/j.apsusc.2011.11.074
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
This review discusses some of the issues that will govern future commercial adoption of ion beam nanoscale fabrication and lithography, with special reference to some major fields of application. Selected recent research advances are highlighted, as they indicate new experimental successes, new insights into complex ion interaction mechanisms, and a fast evolving variety of advanced instrumentation and fabrication resources. It is evident that robust fabrication involving few-nanometer features will be enabled by strategic applications of ion beams, especially if they can be coupled with directed self-assembly. (C) 2011 Elsevier B. V. All rights reserved.
引用
收藏
页码：4103 / 4111
页数：9
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