AlGaN-Free Laser Diodes by Plasma-Assisted Molecular Beam Epitaxy

被引:20
|
作者
Skierbiszewski, Czeslaw [1 ,2 ]
Siekacz, Marcin [1 ,2 ]
Turski, Henryk [1 ]
Muziol, Grzegorz [1 ]
Sawicka, Marta [1 ,2 ]
Feduniewicz-Zmuda, Anna [1 ]
Cywinski, Grzegorz [1 ]
Cheze, Caroline [2 ]
Grzanka, Szymon [1 ]
Perlin, Piotr [1 ,2 ]
Wisniewski, Przemyslaw [1 ,2 ]
Wasilewski, Zbigniew R. [3 ]
Porowski, Sylwester [1 ]
机构
[1] Polish Acad Sci, Inst High Pressure Phys, PL-01142 Warsaw, Poland
[2] TopGaN Ltd, PL-01142 Warsaw, Poland
[3] Natl Res Council Canada, Inst Microstruct Sci, Ottawa, ON K1A 0R6, Canada
关键词
INGAN LASER;
D O I
10.1143/APEX.5.022104
中图分类号
O59 [应用物理学];
学科分类号
摘要
Room-temperature continuous wave lasing at 432nm with a threshold current of 7.6 kA/cm(2) for nitride-based laser diodes (LDs) grown by plasma-assisted molecular beam epitaxy is reported. The diodes were grown on c-plane GaN substrates with a threading dislocation density of 5 x 10(7) cm(-2). We used a simplified laser structure design with GaN claddings where the optical modes were confined by the thick 120nm In0.08Ga0.92N waveguide. Our LDs show a high optical output power of 130mW, a differential gain of 0.5 W/A, and a lifetime of 50 h. (C) 2012 The Japan Society of Applied Physics
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页数:3
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