High-index materials research key to extending immersion lithography

被引：0
|
作者：
Rice, Bryan J. [1 ]
机构：
[1] SEMATECH, Austin, TX 78741 USA
来源：
SOLID STATE TECHNOLOGY | 2008年 / 51卷 / 02期
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D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The adoption of water-based immersion lithography into 45nm half-pitch process is in full swing, but if optical lithography is to continue to dominate leading-edge semiconductors, some advances are needed. In this article, we explore extensions to immersion lithography including high-index immersion and multiple exposure lithography.
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页码：28 / +
页数：5
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