Adsorption and decomposition of SiH4 and surface silicide formation on Cu(111) studied by X-ray absorption fine structure spectroscopy

被引：15
|
作者：
Kanazawa, T
Kitajima, Y
Yokoyama, T
Yagi, S
Imanishi, A
Ohta, T
机构：
[1] UNIV TOKYO, DEPT CHEM, GRAD SCH SCI, BUNKYO KU, TOKYO 113, JAPAN
[2] NATL LAB HIGH ENERGY PHYS, PHOTON FACTORY, TSUKUBA, IBARAKI 305, JAPAN
来源：
SURFACE SCIENCE | 1996年 / 357卷 / 1-3期
关键词：
chemisorption; copper; near edge extended X-ray absorption fine structure (NEXAFS); silane; silicides; silicon; surface extended X-ray absorption line structure (SEXAFS); surface structure; morphology; roughness; and topography;
D O I：
10.1016/0039-6028(96)00080-5
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Adsorption and thermal decomposition of silane (SiH4) on Cu(111) were investigated by Si K-edge X-ray absorption fine structure spectroscopy. It is found that the molecule is adsorbed on the hcp site retaining some of the Si-H bonds at 110 K. After heating the sample to 230 K, Si-Si bonds were recognized in the EXAFS spectra which indicates cluster formation on the surface. Further annealing at 600 K forms a silicide-like structure by substituting some surface Cu atoms by Si ones.
引用
收藏
页码：160 / 164
页数：5
相关论文
共 50 条
  • [31] COMPLETE ADSORPTION SITE INFORMATION FOR CL ON CU(111) USING X-RAY ABSORPTION FINE-STRUCTURE AND PHOTOELECTRON DIFFRACTION
    CRAPPER, MD
    RILEY, CE
    SWEENEY, PJJ
    MCCONVILLE, CF
    WOODRUFF, DP
    JONES, RG
    EUROPHYSICS LETTERS, 1986, 2 (11): : 857 - 861
  • [32] Surface Structure of Organosulfur Stabilized Silver Nanoparticles Studied with X-ray Absorption Spectroscopy
    Padmos, J. Daniel
    Zhang, Peng
    JOURNAL OF PHYSICAL CHEMISTRY C, 2012, 116 (43): : 23094 - 23101
  • [33] ADSORPTION SITE IDENTIFICATION IN SURFACE EXTENDED X-RAY ABSORPTION FINE-STRUCTURE
    CRAPPER, MD
    WOODRUFF, DP
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04): : 914 - 918
  • [34] Oxygen adsorption and oxide formation on Cu-9%Al(111) surface studied using low energy electron diffraction and X-ray photoelectron spectroscopy
    Song, WJ
    Yoshitake, M
    Bera, S
    Yamauchi, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2003, 42 (7B): : 4716 - 4720
  • [35] Oxygen adsorption and oxide formation on Cu-9% Al(111) surface studied using low energy electron diffraction and X-ray photoelectron spectroscopy
    Yoshitake, M. (yoshitake.michiko@nims.go.jp), 1600, Japan Society of Applied Physics (42):
  • [36] EXTENDED X-RAY ABSORPTION FINE-STRUCTURE SPECTROSCOPY
    HAYES, TM
    BOYCE, JB
    SOLID STATE PHYSICS, 1982, 37 : 173 - 351
  • [37] Deconvolution problems in x-ray absorption fine structure spectroscopy
    Klementev, KV
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2001, 34 (15) : 2241 - 2247
  • [38] Local structure of liquid gallium studied by X-ray absorption fine structure
    Wei, SQ
    Oyanagi, H
    Liu, WH
    Hu, TD
    Yin, SL
    Bian, GZ
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2000, 275 (03) : 160 - 168
  • [39] Gallium(III) adsorption on carbonates and oxides: X-ray absorption fine structure spectroscopy study and surface complexation modeling
    Pokrovsky, OS
    Pokrovski, GS
    Schott, J
    JOURNAL OF COLLOID AND INTERFACE SCIENCE, 2004, 279 (02) : 314 - 325
  • [40] STRUCTURE OF X-RAY ABSORPTION-SPECTRA OF SOME TETRAHEDRAL MOLECULES - LII,III SPECTRUM OF CONTINUOUS ABSORPTION OF SILICON IN SIH4
    PAVLYCHEV, AA
    VINOGRADOV, AS
    ZIMKINA, TM
    ONOPKO, DE
    STSARGAN, R
    OPTIKA I SPEKTROSKOPIYA, 1980, 48 (01): : 192 - 194
12345