Scanning capacitance microscopy on cross section and bevelled samples

被引：0
|
作者：
Raineri, V
Daroczi, CS
Lombardo, S
Privitera, V
机构：
[1] CNR, IMETEM, I-95121 Catania, Italy
[2] MFA, MTA, H-1525 Budapest 114, Hungary
来源：
MICROSCOPY OF SEMICONDUCTING MATERIALS 1999, PROCEEDINGS | 1999年 / 164期
关键词：
D O I：
暂无
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Scanning capacitance microscopy (SCM) was performed on p(+)p, p(+)n, pn, n(+)n, n(+)p, and np samples in cross section and bevelled configuration. The bevelling or sectioning sample preparation procedure was found to strongly influence the results of SCM. However, we demonstrate that a significant magnification can be obtained in determining the junction depth by using bevelled samples with respect to cross-sections.
引用
收藏
页码：625 / 628
页数：4
相关论文
共 50 条
  • [21] Sensitivity and resolution limits in scanning capacitance microscopy
    Lányi, S
    Hruskovic, M
    ELECTRICALLY BASED MICROSTRUCTURAL CHARACTERIZATION III, 2002, 699 : 95 - 100
  • [22] SCANNING CAPACITANCE MICROSCOPY ON A 25 NM SCALE
    WILLIAMS, CC
    HOUGH, WP
    RISHTON, SA
    APPLIED PHYSICS LETTERS, 1989, 55 (02) : 203 - 205
  • [23] Low-frequency Scanning Capacitance Microscopy
    Lányi, S
    Hruskovic, M
    ELECTRICALLY BASED MICROSTRUCTURAL CHARACTERIZATION II, 1998, 500 : 3 - 14
  • [24] Scanning capacitance microscopy on semiconductor materials and devices
    Giannazzo, F
    Raineri, V
    PROCEEDINGS OF THE 5TH MULTINATIONAL CONGRESS ON ELECTRON MICROSCOPY, 2001, : 311 - 312
  • [25] Voltage modulation efficiency in scanning capacitance microscopy
    Chang, Mao-Nan
    Chen, Yung-Kuang
    Kao, Hung-Yi
    Chen, Jhih-Yang
    Liu, Chun-Hsien
    Lee, Yao-Jen
    Ultramicroscopy, 2021, 224
  • [26] Scanning capacitance microscopy study of Si devices
    Lim, VSW
    Jiang, YY
    Trigg, A
    MICROSCOPY OF SEMICONDUCTING MATERIALS 2003, 2003, (180): : 649 - 652
  • [27] Application of scanning capacitance microscopy to semiconductor devices
    Nakagiri, N
    Yamamoto, T
    Sugimura, H
    Suzuki, Y
    Miyashita, M
    Watanabe, S
    NANOTECHNOLOGY, 1997, 8 : A32 - A37
  • [28] Application of scanning capacitance microscopy to semiconductor devices
    Nakagiri, Nobuyuki
    Yamamoto, Takuma
    Sugimura, Hiroyuki
    Suzuki, Yoshihiko
    Miyashita, Masayuki
    Watanabe, Shunji
    Nanotechnology, 1997, 8 (3 A):
  • [29] Voltage modulation efficiency in scanning capacitance microscopy
    Chang, Mao-Nan
    Chen, Yung-Kuang
    Kao, Hung-Yi
    Chen, Jhih-Yang
    Liu, Chun-Hsien
    Lee, Yao-Jen
    ULTRAMICROSCOPY, 2021, 224
  • [30] Scanning capacitance microscopy investigations of SiC structures
    Bowallius, O
    Anand, S
    Nordell, N
    Landgren, G
    Karlsson, S
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2001, 4 (1-3) : 209 - 211
12345