The influence of substrate-target orientation on the properties of ZrN films deposited by arc ion plating

被引：3
|
作者：
Du, Jun [1 ]
Zhang, Ping [1 ]
Cai, Zhihai [1 ]
Zhao, Junjun [1 ]
机构：
[1] Acad Armored Force Engn, Natl Key Lab Remfg, Beijing 100072, Peoples R China
来源：
PROCEEDING OF THE FOURTH INTERNATIONAL CONFERENCE ON SURFACE AND INTERFACE SCIENCE AND ENGINEERING | 2011年 / 18卷
关键词：
ZrN; arc ion plating; nanohardness; corrosion resistance; NITROGEN FLOW-RATE; MECHANICAL-PROPERTIES; OXIDATION BEHAVIOR; THIN-FILMS; STRESS; BIAS; TIN;
D O I：
10.1016/j.phpro.2011.06.078
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The crystallograpic structure and properties of Zirconium nitride (ZrN) films deposited on 304 stainless steel were investigated. The substrates were placed either parallel with or perpendicular to the Zirconium target. The ZrN films were found to exhibit {311} orientations when substrate parrallel with target, however {220} orientation when substrates perpendicular to target. SEM results showed that the parallel ZrN films have round-shaped droplets, and perpendicular orientation ZrN films have oval-shaped droplets. The thickness of ZrN films in parallel mode is 1/2 of that in perpendicular mode. Nanoindentation results showed the hardness of ZrN films in perpendicular mode is lower than that of parallel mode. Potentiodynamic scanning results showed the corrosion resistance of films in perpendicular mode is better than that of films in parallel mode. (C) 2011 Published by Elsevier B.V. Selection and/or peer-review under responsibility of Selection and/or peer-review under responsibility of Lanzhou Institute of Physics, China.
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页数：6
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