Characterization and Absolute QE Measurements of Delta-Doped N-Channel and P-Channel CCDs

被引:3
|
作者
Jacquot, Blake C. [1 ]
Monacos, Steve P. [1 ]
Jones, Todd J. [1 ]
Blacksberg, Jordana [1 ]
Hoenk, Michael E. [1 ]
Nikzad, Shouleh [1 ]
机构
[1] CALTECH, Jet Prop Lab, Pasadena, CA 91109 USA
关键词
Delta doping; CCD; QE; PRESSURE; UV;
D O I
10.1117/12.857694
中图分类号
P1 [天文学];
学科分类号
0704 ;
摘要
In this paper we present the methodology for making absolute quantum efficiency (QE) measurements from the vacuum ultraviolet (VUV) through the near infrared (NIR) on delta-doped silicon CCDs. Delta-doped detectors provide an excellent platform to validate measurements through the VUV due to their enhanced UV response. The requirements for measuring QE through the VUV are more strenuous than measurements in the near UV and necessitate, among other things, the use of a vacuum monochromator, and good camera vacuum to prevent chip condensation, and more stringent handling requirements. The system used for these measurements was originally designed for deep UV characterization of CCDs for the WF/PC instrument on Hubble and later for Cassini CCDs.
引用
收藏
页数:12
相关论文
共 50 条
  • [1] Comparison of proton irradiated P-channel and N-channel CCDs
    Gow, Jason P. D.
    Murray, Neil J.
    Holland, Andrew D.
    Burt, David
    Pool, Peter J.
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 2012, 686 : 15 - 19
  • [2] A SYSTEMATIC INVESTIGATION OF N-CHANNEL DELTA-DOPED MOSFETS GROWN BY MBE
    ONEILL, AG
    WOOD, ACG
    PHILLIPS, P
    WHALL, TE
    PARKER, EHC
    GUNDLACH, A
    TAYLOR, S
    MICROELECTRONIC ENGINEERING, 1992, 19 (1-4) : 743 - 746
  • [3] IGFET CIRCUIT PERFORMANCE - N-CHANNEL VERSUS P-CHANNEL
    CHEROFF, G
    CRITCHLOW, DL
    DENNARD, RH
    TERMAN, LM
    IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1969, SC 4 (05) : 267 - +
  • [4] N-CHANNEL OR P-CHANNEL MOS - TAKE YOUR PICK
    MAITLAND, D
    ELECTRONICS, 1970, 43 (16): : 79 - &
  • [5] COMPARISON OF CHARACTERISTICS OF N-CHANNEL AND P-CHANNEL MOSFETS FOR VLSIS
    TAKEDA, E
    NAKAGOME, Y
    KUME, H
    SUZUKI, N
    ASAI, S
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1983, 30 (06) : 675 - 680
  • [6] Design tradeoff guidelines for n-channel delta-doped Si/SiGe heterojunction MOSFETs
    Ip, BK
    Brews, JR
    SOLID-STATE ELECTRONICS, 2000, 44 (04) : 593 - 604
  • [7] CMOS 1/F NOISE - N-CHANNEL VERSUS P-CHANNEL
    MURRAY, DC
    CARTER, JC
    EVANS, AGR
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1990, 51 (04): : 337 - 339
  • [8] CHARACTERISTICS OF A DELTA-DOPED GAAS/LNGAAS P-CHANNEL HETEROSTRUCTURE FIELD-EFFECT TRANSISTOR
    HSU, RT
    HSU, WC
    KAO, MJ
    WANG, JS
    APPLIED PHYSICS LETTERS, 1995, 66 (21) : 2864 - 2866
  • [9] A P-CHANNEL COUPLED DELTA-DOPED SILICON MESFET GROWN BY MOLECULAR-BEAM EPITAXY
    WANG, SJ
    WU, SL
    CHUNG, HD
    CARNS, TK
    ZHENG, X
    WANG, KL
    IEEE ELECTRON DEVICE LETTERS, 1994, 15 (06) : 206 - 208
  • [10] N-Channel and P-channel few-layer InSe photoelectric devices
    Tao, Lin
    Li, Yongtao
    RSC ADVANCES, 2017, 7 (78): : 49694 - 49700