Technology of sub-micrometer MIM tunnel diodes

Development of integrated circuits put modern microelectronics in position of constantly providing devices with better performances. This development is manifested by multiple indicators and trends including: operational frequency, (ii) miniaturization, (iii) minimization of losses, (iv) falling price, etc. In each of the aforementioned trends the microelectronics marked unprecedented progress, making the 3rd and 4th industrial revolution possible. With emerging new markets e.g. Internet of Things (loT) or Terahertz communication (THz), both operating at very high frequencies, enormous need of cheap; (ii) industrially compatible; (iii) operating at high frequencies and (iii) fully integrated devices appeared. In this context MIM (Metal Insulator Metal) diodes are gaining more and more interest. In this work we demonstrate the fabrication process flow of MIM structure acting as tunneling diodes. Presented fabrication technology is fully CMOS-compatible and consists sequence of processes including: dielectric layer deposition, metal layer sputtering, electron beam lithography, etching and metal lift-off. Subsequently after fabrication the MIM diodes were electrically characterized.