Systematic errors for a Mueller matrix dual rotating compensator ellipsometer

被引:36
|
作者
Broch, Laurent [1 ]
Naciri, Aotmane En [1 ]
Johann, Luc [1 ]
机构
[1] Univ Paul Verlaine Metz, Lab Phys Milieux Denses, F-57078 Metz 3, France
来源
OPTICS EXPRESS | 2008年 / 16卷 / 12期
关键词
D O I
10.1364/OE.16.008814
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The characterization of anisotropic materials and complex systems by ellipsometry has pushed the design of instruments to require the measurement of the full reflection Mueller matrix of the sample with a great precision. Therefore Mueller matrix ellipsometers have emerged over the past twenty years. The values of some coefficients of the matrix can be very small and errors due to noise or systematic errors can induce distored analysis. We present a detailed characterization of the systematic errors for a Mueller Matrix Ellipsometer in the dual-rotating compensator configuration. Starting from a general formalism, we derive explicit first-order expressions for the errors on all the coefficients of the Mueller matrix of the sample. The errors caused by inaccuracy of the azimuthal arrangement of the optical components and residual ellipticity introduced by imperfect optical elements are shown. A new method based on a four-zone averaging measurement is proposed to vanish the systematic errors. (c) 2008 Optical Society of America.
引用
收藏
页码:8814 / 8824
页数:11
相关论文
共 50 条
  • [1] Experimental study of the systematic errors for a Mueller matrix double rotating compensator ellipsometer
    Piller, G.
    Broch, L.
    Johann, L.
    PHYSICA STATUS SOLIDI C - CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 5, NO 5, 2008, 5 (05): : 1027 - 1030
  • [2] Multichannel Mueller matrix ellipsometer based on the dual rotating compensator principle
    Chen, C
    An, I
    Ferreira, GM
    Podraza, NJ
    Zapien, JA
    Collins, RW
    THIN SOLID FILMS, 2004, 455 : 14 - 23
  • [3] Second-order systematic errors in Mueller matrix dual rotating compensator ellipsometry
    Broch, Laurent
    Naciri, Aotmane En
    Johann, Luc
    APPLIED OPTICS, 2010, 49 (17) : 3250 - 3258
  • [4] Calibration of focusing lens artifacts in a dual rotating-compensator Mueller matrix ellipsometer
    Fan, Zhentao
    Tang, Yuanyuan
    Wei, Kai
    Zhang, Yudong
    APPLIED OPTICS, 2018, 57 (15) : 4145 - 4152
  • [5] Random error analysis of normalized Fourier coefficient in dual-rotating compensator Mueller matrix ellipsometer
    Miao, Zhengwei
    Tang, Yuanyuan
    Wei, Kai
    Zhang, Yudong
    MEASUREMENT SCIENCE AND TECHNOLOGY, 2021, 32 (12)
  • [6] Mueller matrix ellipsometer using dual continuously rotating anisotropic mirrors
    Ruder, Alexander
    Wright, Brandon
    Peev, Darin
    Feder, Rene
    Kilic, Ufuk
    Hilfiker, Matthew
    Schubert, Eva
    Herzinger, Craig M.
    Schubert, Mathias
    OPTICS LETTERS, 2020, 45 (13) : 3541 - 3544
  • [7] Random Error Estimation and Configuration Optimization of Dual-Rotating Compensator-Mueller Matrix Ellipsometer Calibration Experiments
    Miao Zhengwei
    Tang Yuanyuan
    Wei Kai
    Zhang Yudong
    ACTA OPTICA SINICA, 2021, 41 (24)
  • [8] Measurement errors induced by axis tilt of biplates in dual-rotating compensator Mueller matrix ellipsometers
    Gu, Honggang
    Zhang, Chuanwei
    Jiang, Hao
    Chen, Xiuguo
    Li, Weiqi
    Liu, Shiyuan
    MODELING ASPECTS IN OPTICAL METROLOGY V, 2015, 9526
  • [9] Dual rotating-compensator multichannel ellipsometer: instrument design for real-time Mueller matrix spectroscopy of surfaces and films
    Collins, RW
    Koh, J
    JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION, 1999, 16 (08) : 1997 - 2006
  • [10] Analysis of systematic errors in Mueller matrix ellipsometry as a function of the retardance of the dual rotating compensators
    Broch, Laurent
    Naciri, Aotmane En
    Johann, Luc
    THIN SOLID FILMS, 2011, 519 (09) : 2601 - 2603