Comparision of field electron emission from DLC films produced by four different deposition techniques

被引：25
|
作者：
Karabutov, AV
Konov, VI
Ralchenko, VG
Obraztsova, ED
Frolov, VD
Uglov, SA
Scheibe, HJ
Strelnitskij, VE
Polyakov, VI
机构：
[1] Russian Acad Sci, Inst Gen Phys, Moscow 117942, Russia
[2] Fraunhofer Inst Werkstoffphys, D-01069 Dresden, Germany
[3] Kharkov Phys & Technol Inst, UA-310108 Kharkov, Ukraine
[4] Russian Acad Sci, Inst Radio Engn & Elect, Moscow 103907, Russia
来源：
DIAMOND AND RELATED MATERIALS | 1998年 / 7卷 / 06期
关键词：
field electron emission; diamond-like carbon; deposition;
D O I：
10.1016/S0925-9635(97)00322-1
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Diamond-like carbon (DLC) films produced by ion beam, laser-arc, r.f.-plasma deposition and magnetron sputtering were characterized on the field electron emission properties (thresholds, hysteresis behaviour, stability, homogeneity). The best samples showed electron emission at fields of 4-20 V mu m(-1). Correlations between emission properties and film hardness. Raman spectra, optical band gap, sp(3)-bonded carbon content and electroconductivity were found. A specially designed high vacuum scanning tunneling-field emission microscope was used for simultaneous mapping of film morphology, work function and local field emission intensity. Correlations were observed between emission centres location and work function minima. Factors that improve the field electron emission from DLC films are discussed. (C) 1998 Elsevier Science S.A.
引用
收藏
页码：802 / 806
页数：5
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