Moir; patterns: a simple analytical model

被引：14

作者：

Le Ster, M. ^{[1
]}

Markl, T. ^{[1
]}

Brown, S. A. ^{[1
]}

机构：

[1] Univ Canterbury, MacDiarmid Inst Adv Mat & Nanotechnol, Sch Phys & Chem Sci, Private Bag 4800, Christchurch 8140, New Zealand

来源：

2D MATERIALS | 2020年 / 7卷 / 01期

关键词：

moir; patterns; analytic model; 2D materials; van der Waals heterostructures; DIRAC FERMIONS; GRAPHENE;

D O I：

10.1088/2053-1583/ab5470

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

By considering a straightforward geometrical construction in reciprocal space we derive simple analytical equations that describe the geometry (period and angle) of the moir; patterns (MPs) formed by superposition of any 2D material on any substrate (including other 2D materials). These equations should be valuable tools for interpreting experimentally observed MPs and for designing van der Waals heterostructures in which MPs are used to modulate the topological and/or electronic states of a device.

引用

页数：6

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