SiGe optoelectronic metal-oxide semiconductor field-effect transistor

被引:23
|
作者
Okyay, Ali K. [1 ]
Pethe, Abhijit J. [1 ]
Kuzum, Duygu [1 ]
Latif, Salman [1 ]
Miller, David A. B. [1 ]
Saraswat, Krishna C. [1 ]
机构
[1] Stanford Univ, Ctr Integrated Syst, Stanford, CA 94305 USA
关键词
D O I
10.1364/OL.32.002022
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We propose a novel semiconductor optoelectronic switch that is a fusion of a Ge optical detector and a Si metal-oxide semiconductor field-effect transistor (MOSFET). The device operation is investigated with simulations and experiments. The switch can be fabricated at the nanoscale with extremely low capacitance. This device operates in telecommunication standard wavelengths, hence providing the surrounding Si circuitry with noise immunity from signaling. The Ge gate absorbs light, and the gate photocurrent is amplified at the drain terminal. Experimental current gain of up to 1000x is demonstrated. The device exhibits increased responsivity (similar to 3.5x) and lower off-state current (similar to 4x) compared with traditional detector schemes. (c) 2007 Optical Society of America.
引用
收藏
页码:2022 / 2024
页数:3
相关论文
共 50 条
  • [41] Frequency dependence of measured metal oxide semiconductor field-effect transistor distortion characteristic
    Minami, Takafumi
    Takeda, Yoichi
    Miyake, Masataka
    Miura-Mattausch, Mitiko
    Mattausch, Hance J.
    Ohguro, Tatsuya
    Iizuka, Takahiro
    Taguchi, Masahiko
    Miyamoto, Syunsuke
    Japanese Journal of Applied Physics, 2008, 47 (4 PART 2): : 2610 - 2615
  • [42] Reconsideration of effective channel length for metal-oxide-semiconductor field-effect transistor
    Terada, Kazuo
    Sanai, Kazuhiko
    Tsuji, Katsuhiro
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2014, 53 (06)
  • [43] Frequency dependence of measured metal oxide semiconductor field-effect transistor distortion characteristic
    Minami, Takafumi
    Takeda, Yoichi
    Miyake, Masataka
    Miura-Mattausch, Mitiko
    Mattausch, Hance J.
    Ohguro, Tatsuya
    Iizuka, Takahiro
    Taguchi, Masahiko
    Miyamoto, Syunsuke
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2008, 47 (04) : 2610 - 2615
  • [44] Energy band diagram of A Si metal-oxide-semiconductor field-effect transistor
    Linkoping Univ, Linkoping, Sweden
    IEEE Trans Electron Devices, 8 (1522-1527):
  • [45] Fast 1 kV metal-oxide-semiconductor field-effect transistor switch
    Dedman, CJ
    Roberts, EH
    Gibson, ST
    Lewis, BR
    REVIEW OF SCIENTIFIC INSTRUMENTS, 2001, 72 (09): : 3718 - 3720
  • [46] LOW-TEMPERATURE METAL-OXIDE-SEMICONDUCTOR FIELD-EFFECT TRANSISTOR PREAMPLIFIER
    IMAI, J
    FLORES, R
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1993, 64 (10): : 3024 - 3025
  • [47] A spin metal-oxide-semiconductor field-effect transistor (spin MOSIFET) with a ferromagnetic semiconductor for the channel
    Sugahara, S
    Tanaka, M
    JOURNAL OF APPLIED PHYSICS, 2005, 97 (10)
  • [48] Investigation of metal-oxide semiconductor field-effect transistor-like Si/SiO2/(nano)crystalline PbS heterostructures
    Stancu, V.
    Buda, M.
    Pintilie, L.
    Pintilie, I.
    Botila, T.
    Iordache, G.
    THIN SOLID FILMS, 2008, 516 (12) : 4301 - 4306
  • [49] Study of strain relaxation in Si/SiGe metal-oxide-semiconductor field-effect transistors
    Olsen, SH
    O'Neill, AG
    Dobrosz, P
    Bull, SJ
    Driscoll, LS
    Chattopadhyay, S
    Kwa, KSK
    JOURNAL OF APPLIED PHYSICS, 2005, 97 (11)
  • [50] AlGaN/GaN metal-oxide semiconductor heterostructure field-effect transistor with photo-chemical-vapor deposition SiO2 gate oxide
    Wang, CK
    Chiou, YZ
    Chang, SJ
    Su, YK
    Huang, BR
    Lin, TK
    Chen, SC
    JOURNAL OF ELECTRONIC MATERIALS, 2003, 32 (05) : 407 - 410