Atomic force microscope anodization lithography using organic molecular assembly and ferritin

被引：3

作者：

Lee, Wonbae ^{[1
]}

Kim, Hyunsook

Lee, Haiwon

Hara, Masahiko

机构：

[1] RIKEN, Frontier Res Syst, Wako, Saitama 3510198, Japan

[2] Hanyang Univ, Dept Chem, Seoul 133791, South Korea

来源：

COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS | 2008年 / 313卷

关键词：

nanofabrication; ferritin; AFM lithography; self-assembled monolayer; anodization;

D O I：

10.1016/j.colsurfa.2007.05.044

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Nanopattern fabrications using self-assembled organic layer and exotic bio-material ferritin on silicon substrates by atomic force microscope (AFM) anodization are presented. The self-assembled n-tridecylamine. hydrochloride monolayer (TDAHCI SAM) and ferritin-covered layer are fabricated under fine controls as the organic resists for AFM anodization, and the characterizations are accomplished by AFM and lateral force microscopy (LFM). The resultant patterns are investigated by considering the features of characterized molecular layers for discussing and elucidating the effects of the employed film and ferritin on the AFM anodization. (C) 2007 Elsevier B.V. All rights reserved.

引用

页码：402 / 406

页数：5

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