A protocol for the verification of acid generation in 157 nm lithography

被引：27
|
作者：
Scaiano, JC [1 ]
Laferriere, M
Ivan, MG
Taylor, GN
机构：
[1] Univ Ottawa, Dept Chem, Ottawa, ON K1N 6N5, Canada
[2] Shipley Co Inc, Res & Dev Labs, Marlborough, MA 01752 USA
来源：
MACROMOLECULES | 2003年 / 36卷 / 18期
关键词：
D O I：
10.1021/ma034397d
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
引用
收藏
页码：6692 / 6694
页数：3
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