Hydrogen-related defects in irradiated SiO2

被引:44
|
作者
Bunson, PE
Di Ventra, M
Pantelides, ST
Fleetwood, DM
Schrimpf, RD
机构
[1] Vanderbilt Univ, Dept Elect Engn & Comp Sci, Nashville, TN 37235 USA
[2] Vanderbilt Univ, Dept Phys, Nashville, TN 37235 USA
关键词
D O I
10.1109/23.903767
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The energetics of proton and hydrogen release from hydrogen-complexed defects in silicon dioxide are compared using first-principles density functional theory. These calculations are used to assess models of total dose buildup of interface traps and charge trapping in silicon dioxide. It is found that hydrogen-passivated oxygen vacancies are a likely source of hydrogen and that proton release is favored by at least 1.2 eV over the release of neutral hydrogen. It is also found that the formation energies of most defects do not depend strongly on the local environment in amorphous SiO2, However, the energy of a proton bound to different bridging oxygen sites can vary by more than 1.0 eV, Even when this is taken into account, proton release still, dominates over neutral hydrogen release by more than 0.5 eV, Calculations also show that one defect, the hydrogen bridge, may be a source of EPR inactive, trapped positive charge in the oxide.
引用
收藏
页码:2289 / 2296
页数:8
相关论文
共 50 条
  • [21] Infrared absorption of hydrogen-related defects in ammonothermal GaN
    Suihkonen, Sami
    Pimputkar, Siddha
    Speck, James S.
    Nakamura, Shuji
    APPLIED PHYSICS LETTERS, 2016, 108 (20)
  • [22] Lattice defects dominating hydrogen-related failure of metals
    Takai, K.
    Shoda, H.
    Suzuki, H.
    Nagumo, M.
    ACTA MATERIALIA, 2008, 56 (18) : 5158 - 5167
  • [23] Hydrogen-related defects in titanium dioxide at the interface to palladium
    Sotoudeh, Mohsen
    Bongers-Loth, Marian David
    Roddatis, Vladimir
    Cizek, Jakub
    Nowak, Carsten
    Wenderoth, Martin
    Blochl, Peter
    Pundt, Astrid
    PHYSICAL REVIEW MATERIALS, 2021, 5 (12):
  • [24] Alignment of hydrogen-related defect levels at the Si-SiO2 interface
    Alkauskas, Audrius
    Pasquarello, Alfredo
    PHYSICA B-CONDENSED MATTER, 2007, 401 (546-549) : 546 - 549
  • [25] Defects in SiO2 glass irradiated with high energy Ar ions
    Zhu, ZY
    Jin, YF
    Li, CL
    Sun, YM
    Zhang, CH
    Meng, GH
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1998, 146 (1-4): : 455 - 461
  • [26] Hydrogen-related defects in InGaP/GaAs heterojunction bipolar transistors
    Yamada, Hisashi
    Fukuhara, Noboru
    Hata, Masahiko
    Akimoto, Katsuhiro
    JOURNAL OF CRYSTAL GROWTH, 2008, 310 (23) : 5223 - 5226
  • [27] Influence of Implantation Temperature on the Formation of Hydrogen-Related Defects in InP
    Luce, F. P.
    Reboh, S.
    Vilain, E.
    Madeira, F.
    Barnes, J. P.
    Rochat, N.
    Salvetat, T.
    Tauzin, A.
    Milesi, F.
    Mazen, F.
    Deguet, C.
    2014 20TH INTERNATIONAL CONFERENCE ON ION IMPLANTATION TECHNOLOGY (IIT 2014), 2014,
  • [28] Hydrogen-related mobile charge in the phosphosilicate glass-SiO2-Si structure
    Oborina, E
    Campbell, S
    Hoff, AM
    Gilbert, R
    Persson, E
    JOURNAL OF APPLIED PHYSICS, 2002, 92 (11) : 6773 - 6777
  • [29] Advances in the elucidation of hydrogen-related defects in hydrogenated amorphous silicon
    Singh, A
    Jakovidis, G
    COMMAD 2000 PROCEEDINGS, 2000, : 527 - 530
  • [30] Hydrogen-related defects in ZnO studied by ir absorption spectroscopy
    Lavrov, EV
    Börrnert, F
    Weber, J
    ZINC OXIDE - A MATERIAL FOR MICRO- AND OPTOELECTRONIC APPLICATIONS, 2005, 194 : 133 - 144