Response to "Comment on 'A model of hole trapping in SiO2 films on silicon'" [J. Appl. Phys. 83, 5591 (1998)]

被引：4

作者：

Lenahan, PM ^{[1
]}

Conley, JF

机构：

[1] Penn State Univ, University Pk, PA 16802 USA

[2] Dynam Res Corp, Beaverton, OR 97006 USA

来源：

JOURNAL OF APPLIED PHYSICS | 1998年 / 83卷 / 10期

关键词：

D O I：

10.1063/1.367499

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：5593 / 5594

页数：2

共 50 条

[31] Comment on "Influence of the doping element on the electron mobility in n silicon" [J-Appl. Phys. 83, 3096, (1998)]
Fischetti, MV
Laux, SE
JOURNAL OF APPLIED PHYSICS, 1999, 85 (11) : 7984 - 7985
[32] Comment on "Nitridation effects on Pb1 center structures at SiO2/Si(100) interfaces" [J. Appl. Phys. 95, 4096 (2004)]
Stesmans, A.
Afanas'ev, V. V.
JOURNAL OF APPLIED PHYSICS, 2007, 101 (02)
[33] A model of hole trapping in SiO2 films on silicon
Lenahan, PM
Conley, JF
Wallace, BD
JOURNAL OF APPLIED PHYSICS, 1997, 81 (10) : 6822 - 6824
[34] Response to comment on Model calculation for enhancement factor of a gated field emission nanotube' [J. Appl. Phys. 104, 116103 (2008)]
Lei, D.
Zeng, L.Y.
Wang, W.B.
Journal of Applied Physics, 2008, 104 (11):
[35] Comment on 'equation of state of aluminum nitride and its shock response' [J. Appl. Phys. 76, 4077 (1994)]
Rosenberg, Z.
Brar, N.S.
Journal of Applied Physics, 1995, 78 (09):
[36] Response to "Comment on 'Model calculation for enhancement factor of a gated field emission nanotube'" [J. Appl. Phys. 104, 116103 (2008)]
Lei, D.
Zeng, L. Y.
Wang, W. B.
JOURNAL OF APPLIED PHYSICS, 2008, 104 (11)
[37] Response to "Comment on 'Two pathways for photon upconversion in model organic compound systems' [J. Appl. Phys. 101, 023101 (2007)]"
Baluschev, S.
Yakutkin, V.
Wegner, G.
Minch, B.
Miteva, T.
Nelles, G.
Yasuda, A.
JOURNAL OF APPLIED PHYSICS, 2007, 102 (07)
[38] Response to "Comment on 'The effects of Si doping on dislocation movement and tensile stress in GaN films'" [J. Appl. Phys. 109, 073509 (2011)]
Moram, M. A.
Kappers, M. J.
Massabuau, F.
Oliver, R. A.
Humphreys, C. J.
JOURNAL OF APPLIED PHYSICS, 2011, 110 (09)
[39] Comment on "Monte Carlo simulation of the laser-induced plasma plume expansion under vacuum: Comparison with experiments'' [J. Appl. Phys. 83, 5075, (1998)]
Itina, TE
JOURNAL OF APPLIED PHYSICS, 1999, 86 (08) : 4709 - 4710
[40] Comment on `Monte Carlo simulation of the laser-induced plasma plume expansion under vacuum: Comparison with experiments' [J. Appl. Phys. 83, 5075 (1998)]
J Appl Phys, 8 (4709):

← 1 2 3 4 5 →