Ion behavior in capacitively-coupled dual-frequency discharges

被引：32
|
作者：
Donko, Zoltan [1 ]
机构：
[1] Hungarian Acad Sci, Res Inst Solid State Phys & Opt, H-1525 Budapest, Hungary
来源：
RADICALS AND NON-EQUILIBRIUM PROCESSES IN LOW-TEMPERATURE PLASMAS | 2007年 / 86卷
关键词：
D O I：
10.1088/1742-6596/86/1/012011
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
Particle-in-cell (PIC/MCC) simulations of capacitively-coupled Ar, CF4, and CF4/Ar discharges excited by a single RF source or by two sources of different frequencies are presented. The properties and the formation mechanism of the flux-energy distribution of the ions reaching the electrodes is analyzed in detail. It is demonstrated that at low pressures the ion energy and the ion flux can nearly independently be controlled by properly choosing the excitation frequencies.
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页数：10
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