X-ray photoelectron spectroscopy study of junction interface in In/BaRbBiO films

被引：0
|
作者：
Toda, F
Yamada, T
Kishida, S
Tokutaka, H
机构：
[1] Oki Elect Ind Co Ltd, Hachioji, Tokyo 193, Japan
[2] Tottori Univ, Dept Elect & Elect Engn, Tottori 680, Japan
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1998年 / 37卷 / 5A期
关键词：
BRBO film; three-terminal device; X-ray photoelectron spectroscopy; chemical state analysis; superconductor; native barrier;
D O I：
10.1143/JJAP.37.2482
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The In/BRBO/STO specimens were fabricated by depositing Ba0.6Rb0.4Bi1.0Oy (BRBO) on the SrTiO3 (STO) substrates by means of molecular beam epitaxy using 100% pure ozone and then, by depositing In metal. From the X-ray photoelectron spectroscopy results, we found that the In metal deposited on the BRBO/STO specimen removed the oxygen from BRBO and produced InOx layer at the interface between In metal and BRBO.
引用
收藏
页码：2482 / 2484
页数：3
相关论文
共 50 条
  • [21] X-ray photoelectron spectroscopy study of the chemical interaction at the Pd/SiC interface
    Zhang, Y.
    Gajjala, G.
    Hofmann, T.
    Weinhardt, L.
    Baer, M.
    Heske, C.
    Seelmann-Eggebert, M.
    Meisen, P.
    JOURNAL OF APPLIED PHYSICS, 2010, 108 (09)
  • [22] STUDY OF PHOTOLYSIS WITH X-RAY PHOTOELECTRON SPECTROSCOPY
    PLAKSIN, P
    SHARMA, J
    BULUSU, S
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1972, 17 (03): : 354 - &
  • [23] Atomic Force Microscopy and X-ray Photoelectron Spectroscopy Study on the Surface and Interface States of Liq and ITO Films
    Li, Jianfeng
    Song, Qing
    Shi, Weibing
    Zhang, Fujia
    NEW MATERIALS AND ADVANCED MATERIALS, PTS 1 AND 2, 2011, 152-153 : 566 - +
  • [24] X-ray photoelectron spectroscopy and grazing incidence X-ray reflectivity study of silicon nitride thin films
    Li, BQ
    Fujimoto, T
    Fukumoto, N
    Honda, K
    Kojima, I
    THIN SOLID FILMS, 1998, 334 (1-2) : 140 - 144
  • [25] An X-ray photoelectron spectroscopy study of ultra-thin oxynitride films
    Ladas, S.
    Sygellou, L.
    Kennou, S.
    Wolf, M.
    Roeder, G.
    Nutsch, A.
    Rambach, M.
    Lerch, W.
    THIN SOLID FILMS, 2011, 520 (02) : 871 - 875
  • [26] X-RAY PHOTOELECTRON SPECTROSCOPY
    HOLLANDER, JM
    JOLLY, WL
    ACCOUNTS OF CHEMICAL RESEARCH, 1970, 3 (06) : 193 - +
  • [27] X-RAY PHOTOELECTRON SPECTROSCOPY
    FRIEDMAN, RM
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1972, : 8 - &
  • [28] X-ray photoelectron spectroscopy
    Weil, R
    PLATING AND SURFACE FINISHING, 1997, 84 (07): : 64 - 64
  • [29] X-ray photoelectron spectroscopy study of CuFeSe2 thin films
    Bernede, JC
    Hamdadou, N
    Khelil, A
    JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 2004, 141 (01) : 61 - 66
  • [30] Raman and X-ray photoelectron spectroscopy study of carbon nitride thin films
    Petrov, P
    Dimitrov, DB
    Papadimitriou, D
    Beshkov, G
    Krastev, V
    Georgiev, C
    APPLIED SURFACE SCIENCE, 1999, 151 (3-4) : 233 - 238
12345