Microstructural changes during annealing of FePd-based thin films

被引：21
|
作者：
Xu, HP
Heinrich, H
Wiezorek, JMK
机构：
[1] Univ Pittsburgh, Dept Mat Sci & Engn, Pittsburgh, PA 15261 USA
[2] ETH, Inst Appl Phys, CH-8093 Zurich, Switzerland
来源：
INTERMETALLICS | 2003年 / 11卷 / 09期
基金：
美国国家科学基金会;
关键词：
intermetallics : FePd; phase transformation; thin films; microstructure; evolution of microstructure (annealing); electron microscopy; transmission;
D O I：
10.1016/S0966-9795(03)00100-6
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The microstructural changes in magnetron sputtered Fe-Pd thin films during annealing at 400-500degreesC have been studied by transmission electron microscopy. Room-temperature deposition produced disordered Fe-Pd phase with (111)-twinned grains approximately 18 nm in size. Ll(0)-type ordering was complete for annealing at 450 and 500degreesC after 1.8 ks. accompanied by grain growth (40-70 nm). The ordered FePd grains contained (111)-twins rather than {101}-twins typical of bulk ordered FePd. A critical grain size that is larger than the maximum grain size of 70nm observed here may, exist below which the transformation-strain-induced {101}-polytwin formation is suppressed in Ll(0)-ordered FePd. The metallic Pt overlayers and the Ti and NiCr underlayers selected here produced detrimental dissolution (Pt into Fe-Pd phases) and did not prevent precipitation reactions between Pd and the Si substrate during annealing. (C) 2003 Elsevier Ltd. All rights reserved.
引用
收藏
页码：963 / 969
页数：7
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