Lateral characteristic calibration of an atomic force microscope using a Cr atomic deposition grating

被引:0
|
作者
Wu, Junjie [1 ]
Cai, Xiaoyu [1 ]
Li, Yuan [1 ]
Fu, Yunxia [1 ]
Wei, Jiasi [1 ]
机构
[1] Shanghai Inst Measurement & Testing Technol, 1500 Zhangheng Rd, Shanghai, Peoples R China
关键词
D O I
10.1109/NEMS51815.2021.9451407
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents the lateral characteristic calibration of an atomic force microscope (AFM) using a Cr atomic deposition grating. A Cr atomic deposition grating with a pitch of 212.8 nm was used to calibrate the lateral properties of the AFM. The pitch of the Cr atomic deposition grating can be directly traced to the standing laser wavelength. The coefficient of the AFM has been corrected according to the calibration results. Then, a 3-mu m grating was measured before and after calibration to verify the effectiveness of the calibration. The uncertainty of the measurement result was analyzed.
引用
收藏
页码:255 / 258
页数:4
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