Preparation and photoelectron spectroscopy study of UNx thin films

被引:66
|
作者
Black, L
Miserque, F
Gouder, T
Havela, L
Rebizant, J
Wastin, F
机构
[1] Commiss European Communities, Joint Res Ctr, Inst Transuranium Elements, D-76125 Karlsruhe, Germany
[2] Fac Univ Notre Dame Paix, B-5000 Namur, Belgium
[3] Charles Univ Prague, Dept Elect Struct, Prague 12116 2, Czech Republic
关键词
actinide compounds; thin films; nitride materials; electronic band structure; photoelectron spectroscopy;
D O I
10.1016/S0925-8388(00)01307-4
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Thin films of UN and U2N3 were prepared by reactive DC sputtering of U in N-2-containing atmosphere. The composition of the films was modified by varying the partial pressure of N-2. 4f-Core-level photoelectron spectra as well as valence-band spectra obtained with HeII and HeI photoexcitation confirm the itinerant character of the 5f-electronic states in UN, showing a high density of states at the Fermi energy. The 4f peaks in U2N3 are shifted towards higher binding energy and rue symmetric, indicating a low density of states at the Fermi level. Valence-band spectra show indeed a maximum of 5f emission at 0.8 eV below the Fermi level, but some 5f intensity at the Fermi level is preserved, contradicting full 5f localisation. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:36 / 41
页数:6
相关论文
共 50 条
  • [21] Behavior of oxygen doped SiC thin films:: An x-ray photoelectron spectroscopy study
    Avila, A
    Montero, I
    Galán, L
    Ripalda, JM
    Levy, R
    JOURNAL OF APPLIED PHYSICS, 2001, 89 (01) : 212 - 216
  • [22] Photoelectron spectroscopy study of U-Ni alloys: a comparison of thin films and bulk systems
    Black, L
    Gouder, T
    Wastin, F
    Rebizant, J
    Havela, L
    SURFACE SCIENCE, 2002, 504 (1-3) : 83 - 92
  • [24] Thermochromic VO2 thin films studied by photoelectron spectroscopy
    Christmann, T
    Felde, B
    Niessner, W
    Schalch, D
    Scharmann, A
    THIN SOLID FILMS, 1996, 287 (1-2) : 134 - 138
  • [25] X-ray photoelectron spectroscopy studies of ITO thin films
    Chen, Meng
    Pei, Zhiliang
    Bai, Xuedong
    Huang, Rongfang
    Wen, Lishi
    2000, Sci Press (15):
  • [26] THICKNESS OF THIN SURFACE-FILMS DETERMINED BY PHOTOELECTRON-SPECTROSCOPY
    LEWIS, G
    FOX, PG
    CORROSION SCIENCE, 1978, 18 (07) : 645 - 650
  • [27] X-ray photoelectron spectroscopy studies of ITO thin films
    Chen, M
    Pei, ZL
    Bai, XD
    Huang, RF
    Wen, LS
    JOURNAL OF INORGANIC MATERIALS, 2000, 15 (01) : 188 - 192
  • [28] Auger electron spectroscopy/x-ray photoelectron spectroscopy study of Ti-B-N thin films
    Baker, M.A.
    Steiner, A.
    Haupt, J.
    Gissler, W.
    Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1995, 13 (3 pt 2):
  • [29] Auger electron spectroscopy/x-ray photoelectron spectroscopy study of Ti-B-N thin films
    Baker, M.A.
    Steiner, A.
    Haupt, J.
    Gissler, W.
    Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 1995, 13 (03): : 1633 - 1638
  • [30] Niobium oxides films on GaN: Photoelectron spectroscopy study
    Lewandkow, R.
    Mazur, P.
    Grodzicki, M.
    THIN SOLID FILMS, 2022, 763