Response of free-standing graphene monolayer exposed to ultrashort intense XUV pulse from free-electron laser

被引:2
|
作者
Medvedev, N. [1 ,2 ]
Noei, H. [3 ]
Toleikis, S. [3 ]
Ziaja, B. [4 ,5 ]
机构
[1] Czech Acad Sci, Inst Phys, Na Slovance 2, Prague 18221 8, Czech Republic
[2] Czech Acad Sci, Inst Plasma Phys, Za Slovankou 3, Prague 18200 8, Czech Republic
[3] DESY, Notkestr 85, D-22607 Hamburg, Germany
[4] DESY, Ctr Free Electron Laser Sci CFEL, D-22607 Hamburg, Germany
[5] Polish Acad Sci, Inst Nucl Phys, Radzikowskiego 152, PL-31342 Krakow, Poland
来源
JOURNAL OF CHEMICAL PHYSICS | 2021年 / 154卷 / 20期
关键词
TRANSMISSION; DIFFRACTION; CREATION; DAMAGE; RAMAN;
D O I
10.1063/5.0041261
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The response of a free-standing graphene monolayer exposed to a few tens of femtoseconds long extreme ultraviolet (XUV) pulse was studied theoretically in order to analyze and compare contributions of various mechanisms to the graphene damage, understood here as a global atomic disintegration. Our simulation results indicate that nonthermal disintegration of the atomic structure is the predominant damage mechanism for a free-standing graphene layer. Only at high absorbed doses, charge-induced disintegration of the graphene structure prevails. We also demonstrate that the progressing damage can be probed by femtosecond optical pulses in the soft UV regime (4 eV photon energy). The achieved quantitative understanding of the damage mechanisms may enable a better control of graphene-based devices when they are exposed to x-ray radiation, as well as an efficient processing of graphene layers with ultrashort intense XUV pulses.
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页数:8
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