Energy Harvesting in the Back-End of Line with CMOS Compatible Ferroelectric Hafnium Oxide

被引：11

作者：

Mart, C. ^{[1
]}

Abdulazhanov, S. ^{[1
]}

Czernohorsky, M. ^{[1
]}

Kaempfe, T. ^{[1
]}

Lehninger, D. ^{[1
]}

Falidas, K. ^{[1
]}

Esslinger, S. ^{[1
]}

Kuehnel, K. ^{[1
]}

Oehler, S. ^{[1
]}

Rudolph, M. ^{[1
]}

Wiatr, M. ^{[2
]}

Kolodinski, S. ^{[2
]}

Seidel, R. ^{[2
]}

Weinreich, W. ^{[1
]}

Eng, L. M. ^{[3
]}

机构：

[1] Fraunhofer Inst Photon Microsyst, Dresden, Germany

[2] GLOBALFOUNDRIES, Dresden, Germany

[3] Tech Univ Dresden, Inst Appl Phys, Dresden, Germany

来源：

2020 IEEE INTERNATIONAL ELECTRON DEVICES MEETING (IEDM) | 2020年

关键词：

D O I：

10.1109/IEDM13553.2020.9371967

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We demonstrate the feasibility of thermal energy recovery in the back end of line (BEoL) employing CMOS-compatible ferroelectric hafnium oxide. Efficient pyroelectric energy harvesting with a sizable power density of 92 mWcm(-3) under typical thermal conditions is achieved. Our energy harvesting approach exceeds the efficiency limit of commonly-used thermoelectric materials, without using a heat switch. The low-voltage operation, scalability, and abundance in CMOS manufacturing make HfO2-based ferroelectrics promising candidates for integrated energy harvesting and solid-state refrigeration applications.

引用

页数：4

共 50 条

[31] Back-End-of-Line-Compatible Anneal-Free Ferroelectric Field-Effect Transistor
Tsai, Shih-Hao
Li, Zhonghua
Phyu, Ma Mo Mo Ei
Fang, Zihang
Hooda, Sonu
Chen, Chun-Kuei
Zamburg, Evgeny
Thean, Aaron Voon-Yew
[J]. 2023 7TH IEEE ELECTRON DEVICES TECHNOLOGY & MANUFACTURING CONFERENCE, EDTM, 2023,
[32] Deuterium Implantation at the Back-end of Line for the Improvement of Gate Oxide Reliability in Nano-scale MOSFETs
Lee, Jae-Sung
Do, Seung-Woo
Lee, Yong-Hyun
[J]. 2007 7TH IEEE CONFERENCE ON NANOTECHNOLOGY, VOL 1-3, 2007, : 911 - +
[33] MoS2 as an Effective Cu Diffusion Barrier with a Back-End Compatible Process
Kuo, Chi-Yuan
Chang, Ya-Ting
Huang, Yu-Ting
Ni, I-Chih
Chen, Mei-Hsin
Wu, Chih-, I
[J]. ACS APPLIED MATERIALS & INTERFACES, 2023, 15 (40) : 47845 - 47854
[34] Atomic layer deposited second-order nonlinear optical metamaterial for back-end integration with CMOS-compatible nanophotonic circuitry
Clemmen, Stephane
Hermans, Artur
Solano, Eduardo
Dendooven, Jolien
Koskinen, Kalle
Kauranen, Martti
Brainis, Edouard
Detavernier, Christophe
Baets, Roel
[J]. OPTICS LETTERS, 2015, 40 (22) : 5371 - 5374
[35] Pyroelectric CMOS Compatible Sensor Element Based on Hafnium Oxide Thin Films
Mart, C.
Viegas, A.
Esslinger, S.
Czernohorsky, M.
Weinreich, W.
Mutschall, D.
Kaiser, A.
Neumann, N.
Grossmann, T.
Hiller, K.
Eng, L. M.
[J]. 2020 JOINT CONFERENCE OF THE IEEE INTERNATIONAL FREQUENCY CONTROL SYMPOSIUM AND INTERNATIONAL SYMPOSIUM ON APPLICATIONS OF FERROELECTRICS (IFCS-ISAF), 2020,
[36] Challenges in the implementation of low-k dielectrics in the back-end of line
Hoofman, RJOM
Verheijden, GJAM
Michelon, J
Iacopi, F
Travaly, Y
Baklanov, MR
Tökei, Z
Beyer, GP
[J]. MICROELECTRONIC ENGINEERING, 2005, 80 : 337 - 344
[37] A Comparative Analysis of Front-End and Back-End Compatible Silicon Photonic On-Chip Interconnects
Thakkar, Ishan G.
Chittamuru, Sai Vineel Reddy
Pasricha, Sudeep
[J]. PROCEEDINGS OF THE 18TH ACM/IEEE SYSTEM LEVEL INTERCONNECT PREDICTION 2016 WORKSHOP (SLIP '16), 2016,
[38] Harvesting microwave energy using pyroelectricity of nanostructured graphene/zirconium-doped hafnium oxide ferroelectric heterostructures
Dragoman, Mircea
Aldrigo, Martino
Dinescu, Adrian
Vasilache, Dan
Iordanescu, Sergiu
Dragoman, Daniela
Laudadio, Emiliano
Pavoni, Eleonora
[J]. NANOTECHNOLOGY, 2023, 34 (20)
[39] Back-End-of-Line-Compatible Fin-Gate ZnO Ferroelectric Field-Effect Transistors
Kong, Qiwen
Liu, Long
Zheng, Zijie
Sun, Chen
Zhou, Zuopu
Jiao, Leming
Kumar, Annie
Shao, Rui
Zhang, Jishen
Xu, Haiwen
Chen, Yue
Nguyen, Bich-Yen
Gong, Xiao
[J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2023, 70 (04) : 2059 - 2066
[40] Back-End and Flexible Substrate Compatible Analog Ferroelectric Field-Effect Transistors for Accurate Online Training in Deep Neural Network Accelerators
Majumdar, Sayani
Zeimpekis, Ioannis
[J]. ADVANCED INTELLIGENT SYSTEMS, 2023, 5 (11)

← 1 2 3 4 5 →