Analysis of Plasmon Excited by Metal-Insulator-Metal Structure with Insulator Thickness of Hundreds of Nanometers

被引:0
|
作者
Tamura, Masaya [1 ]
Kagata, Hiroshi [1 ]
机构
[1] Panason Elect Devices Co Ltd, Corp Components Dev Ctr, Kadoma, Osaka 5718506, Japan
关键词
plasmon; sensor; plasmon-polariton; electromagnetic wave; negative permittivity;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents the analysis of plasmon excited by Metal-Insulator-Metal (MIM) structure with insulator thickness of hundreds of nanometers. Since the surface plasmons on each metal excited by the electromagnetic waves that enters the MIM structure is coupled to each other, the incident wave is probably absorbed. At that time, the standing wave is generated in the insulator. We explain the principle of the MIM structure by confirming it with an electromagnetic simulator. We also confirm that the surface plasmon resonant wave is changed by the variation of the insulator thickness. Furthermore, the MIM structure's resonant wavelengths are calculated using a multilayer filter approach and shows good agreement with 3D simulation and measurement.
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页码:356 / 359
页数:4
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