Self-assembling of metal nanoparticles on patterned semiconductor surfaces (Au/GaAs)

被引:11
|
作者
Barlas, TR [1 ]
Dmitruk, NL [1 ]
Kotova, NV [1 ]
Mayeva, OI [1 ]
Romanyuk, VR [1 ]
机构
[1] NAS Ukraine, Inst Semicond Phys, UA-03028 Kiev, Ukraine
关键词
microrelief; metal nanoparticles; metal-semiconductor interface; electroless deposition; diffusion layer;
D O I
10.1016/j.spmi.2005.04.003
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The fabrication of selectively deposited arrays of metal nanoparticles on textured semiconductor surfaces is reported. Gold nanoparticles were grown on previously textured surfaces using photostimulated chemical deposition from an aqueous solution of AuCl3 salt. Surfaces with random and periodic microreliefs were used as templates of sites for nanoparticle deposition. Dendritelike and quasi-grating-like microreliefs were produced by anisotropic etching of GaAs (100) substrates. Periodic reliefs (diffraction gratings and bi-gratings) were fabricated by the holographic photochemical etching of the same substrates. Our results from AFM, SEM and EDX show that gold predominantly locates on the tops of the microreliefs. Since the surface relief strongly affects the topology of metal deposition, the use of microprofiling of semiconductor surfaces allows designing nanostructure deposition. (C) 2005 Elsevier Ltd. All rights reserved.
引用
收藏
页码:130 / 141
页数:12
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