Topological insulator Bi2Se3 thin films grown on double-layer graphene by molecular beam epitaxy

被引:160
|
作者
Song, Can-Li [1 ,2 ]
Wang, Yi-Lin [1 ]
Jiang, Ye-Ping [1 ,2 ]
Zhang, Yi [1 ]
Chang, Cui-Zu [1 ,2 ]
Wang, Lili [1 ]
He, Ke [1 ]
Chen, Xi [2 ]
Jia, Jin-Feng [2 ]
Wang, Yayu [2 ]
Fang, Zhong [1 ]
Dai, Xi [1 ]
Xie, Xin-Cheng [1 ]
Qi, Xiao-Liang [3 ]
Zhang, Shou-Cheng [3 ]
Xue, Qi-Kun [1 ,2 ]
Ma, Xucun [1 ]
机构
[1] Chinese Acad Sci, Inst Phys, Beijing 100190, Peoples R China
[2] Tsinghua Univ, Dept Phys, Beijing 100084, Peoples R China
[3] Stanford Univ, Dept Phys, Stanford, CA 94305 USA
基金
美国国家科学基金会;
关键词
SINGLE DIRAC CONE; BI2TE3;
D O I
10.1063/1.3494595
中图分类号
O59 [应用物理学];
学科分类号
摘要
Atomically flat thin films of topological insulator Bi2Se3 have been grown on double-layer graphene formed on 6H-SiC(0001) substrate by molecular beam epitaxy. By a combined study of reflection high energy electron diffraction and scanning tunneling microscopy, we identified the Se-rich condition and temperature criterion for layer-by-layer growth of epitaxial Bi2Se3 films. The as-grown films without doping exhibit a low defect density of 1.0 +/- 0.2X10(11)/cm(2), and become a bulk insulator at a thickness of ten quintuple layers, as revealed by in situ angle resolved photoemission spectroscopy measurement. (C) 2010 American Institute of Physics. [doi:10.1063/1.3494595]
引用
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页数:3
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