A method of forming a self-cleaning hydrophobic nanocoating (SCHN) on glass substrates utilizing a scalable manufacturing process is described. The process initiates with roughening of planar glass surfaces using diamond micro-/nano-particle abrasives, which creates microscopic tortuous grooves. After cleaning the substrates, the roughened surface is vapor deposited with trichloro (1H,1H,2H,2H-perfluorooctyl)silane (TCPFOS) under enclosure with controlled humidity. TCPFOS chemically binds with the substrate via covalent linkage. Due to the greatly reduced surface tension between water and the self-cleaning surface, the water droplet slides down leaving no trail (sliding angle of 14 degrees for 0.1 mL water droplet). Due to the reduced adhesion of dirt to the self-cleaning surface, the dirt particles are washed away by sliding or rolling water droplets. The SCHN shows a negligible change in transmission as compared to the original glass substrate. The coating is resistant to multiple environmental factors including abrasion cycles, acid rain (pH = 3), saline exposure (10% w/v), alkali solution (pH 11, NaOH), and extreme temperature cycling (-10 to 60 degrees C).
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CUNY, Coll Staten Isl, Dept Chem, Staten Isl, NY 10314 USA
CUNY, Grad Ctr, PhD Program Chem, New York, NY 10016 USACUNY, Coll Staten Isl, Dept Chem, Staten Isl, NY 10314 USA
Abeywardena, Madupa
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Zimmermann, Thomas
Xu, Qianfeng
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CUNY, Coll Staten Isl, Dept Chem, Staten Isl, NY 10314 USA
ARL Designs LLC, Summit, NJ 07901 USACUNY, Coll Staten Isl, Dept Chem, Staten Isl, NY 10314 USA
Xu, Qianfeng
Loebmann, Peer
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Fraunhofer Inst Silicate Res ISC, Neunerplatz 2, D-97082 Wurzburg, GermanyCUNY, Coll Staten Isl, Dept Chem, Staten Isl, NY 10314 USA
Loebmann, Peer
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Mandel, Karl
Stauch, Claudia
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Fraunhofer Inst Silicate Res ISC, Neunerplatz 2, D-97082 Wurzburg, GermanyCUNY, Coll Staten Isl, Dept Chem, Staten Isl, NY 10314 USA
Stauch, Claudia
Lyons, Alan
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CUNY, Coll Staten Isl, Dept Chem, Staten Isl, NY 10314 USA
CUNY, Grad Ctr, PhD Program Chem, New York, NY 10016 USA
ARL Designs LLC, Summit, NJ 07901 USACUNY, Coll Staten Isl, Dept Chem, Staten Isl, NY 10314 USA
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United Arab Emirates Univ, Natl Water & Energy Ctr, Al Ain 15551, U Arab EmiratesSRM Univ AP Andhra Pradesh, Dept Phys, Amaravati 522502, Andhra Prades, India
Sangaraju, Sambasivam
Chakrabortty, Sabyasachi
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SRM Univ AP Andhra Pradesh, Dept Chem, Amaravati 522502, Andhra Prades, IndiaSRM Univ AP Andhra Pradesh, Dept Phys, Amaravati 522502, Andhra Prades, India
Chakrabortty, Sabyasachi
Krishnamurthy, Satheesh
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Univ Surrey, Adv Technol Inst, Surrey Ion Beam Ctr, Guildford GU2 7XH, EnglandSRM Univ AP Andhra Pradesh, Dept Phys, Amaravati 522502, Andhra Prades, India
Krishnamurthy, Satheesh
Ghosh, Siddhartha
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SRM Univ AP Andhra Pradesh, Dept Phys, Amaravati 522502, Andhra Prades, IndiaSRM Univ AP Andhra Pradesh, Dept Phys, Amaravati 522502, Andhra Prades, India