Effect of Sb2Se on phase change characteristics of Ge2Sb2Te5

被引:17
|
作者
Wang, Miao [1 ]
Lu, Yegang [1 ]
Shen, Xiang [2 ]
Wang, Guoxiang [2 ]
Li, Jun [1 ]
Dai, Shixun [2 ]
Song, Sannian [3 ]
Song, Zhitang [3 ]
机构
[1] Ningbo Univ, Fac Informat Sci & Engn, Ningbo 315211, Zhejiang, Peoples R China
[2] Ningbo Univ, Lab Infrared Mat & Devices, Adv Technol Res Inst, Ningbo 315211, Zhejiang, Peoples R China
[3] Chinese Acad Sci, State Key Lab Funct Mat Informat, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China
来源
CRYSTENGCOMM | 2015年 / 17卷 / 26期
基金
中国国家自然科学基金;
关键词
AMORPHOUS THIN-FILMS; DOPED GE2SB2TE5; TRANSITION; CRYSTALLIZATION; STABILITY; POWER;
D O I
10.1039/c5ce00656b
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
In this paper, the effect of Sb2Se on the phase change characteristics of Ge2Sb2Te5 (GST) is systemically studied for applications in phase-change random access memory (PRAM). The crystallization temperature of Sb2Se-GST increases with increasing Sb2Se content, while the archival life of the amorphous state first decreases and then increases. The phase transition from face-centered-cubic (FCC) to hexagonal (HEX) is suppressed when the Se atomic percentage is higher than 9% for Sb2Se-GST films. The wide band gap and high value of B-1/2 lead to a contrast in resistance of about five orders of magnitude between the amorphous and crystalline states. Compared with GST, Ge4Sb52Te9Se35 shows a high crystallization temperature, a wider band gap and a fast switching speed, suggesting it is a potential candidate for PRAM.
引用
收藏
页码:4871 / 4876
页数:6
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