Complementary Metal Oxide Semiconductor Image Sensor Using Gate/Body-tied P-channel Metal Oxide Semiconductor Field Effect Transistor-type Photodetector for High-speed Binary Operatione

被引:2
|
作者
Choi, Byoung-Soo [1 ]
Kim, Sang-Hwan [1 ]
Lee, Jimin [1 ]
Oh, Chang-Woo [2 ]
Seo, Sang-Ho [1 ]
Shin, Jang-Kyoo [1 ]
机构
[1] Kyungpook Natl Univ, Sch Elect Engn, 80 Daehak Ro, Daegu 41566, South Korea
[2] Kyungpook Natl Univ, Dept Sensor & Display Engn, 80 Daehak Ro, Daegu 41566, South Korea
关键词
CMOS; image sensor; binary operation; gate/body-tied PMOSFET; photodetector; DIODE;
D O I
10.18494/SAM.2018.1643
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
In this paper, we propose a CMOS image sensor that uses a gate/body-tied p-chnnel metal oxide semiconductor field effect transistor (PMOSFET)-type photodetector for highspeed binary operation. The sensitivity of the gate/body-tied PMOSFET-type photodetector is approximately six times that of the p-n junction photodetector for the same area. Thus, an active pixel sensor with a highly sensitive gate/body-tied PMOSFET-type photodetector is more appropriate for high-speed binary operation. Moreover, the CMOS image sensor for binary operation has the advantages of low power consumption and a simple circuit because an analog to-digital converter is not necessary. The proposed image sensor was fabricated and measured using a CMOS 0.35 mu m conventional process.
引用
收藏
页码:129 / 134
页数:6
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