AFM investigation of MoS2 thin films

被引:3
|
作者
Belikov, A. I. [1 ]
Do Thi Nhan [1 ]
Kalinin, V. N. [1 ]
机构
[1] BMSTU, Dept Elect Technol Mech Engn, Moscow 105005, Russia
关键词
D O I
10.1088/1757-899X/387/1/012007
中图分类号
O59 [应用物理学];
学科分类号
摘要
Molybdenum disulfide thin films deposited on silicon substrates by the magnetron sputtering structural features investigation by atomic force microscope results are presented.
引用
收藏
页数:4
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