Growth of III-V semiconductor nanowires and their heterostructures

被引:20
|
作者
Li, Ang [1 ]
Zou, Jin [2 ,3 ]
Han, Xiaodong [1 ]
机构
[1] Beijing Univ Technol, Inst Microstruct & Property Adv Mat, Beijing 100124, Peoples R China
[2] Univ Queensland, Sch Mech & Min Engn, St Lucia, Qld 4072, Australia
[3] Univ Queensland, Ctr Microscopy & Microanal, St Lucia, Qld 4072, Australia
基金
中国国家自然科学基金;
关键词
III-V semiconductor heterostructure; nanowire; advanced charactrization; epitaxy growth; CHEMICAL BEAM EPITAXY; LIQUID-SOLID MECHANISM; ATOM-PROBE TOMOGRAPHY; CORE-SHELL NANOWIRES; NANOMETER-SCALE GAAS; RAMAN-SCATTERING; OPTICAL-PROPERTIES; INP NANOWIRES; TWINNING SUPERLATTICES; ZINC-BLENDE;
D O I
10.1007/s40843-016-0119-9
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this paper, we present a review about recent progress on the growth of III-V semiconductor homo-and heterostructured nanowires. We will first deliver a general discussion on the crystal structure and the conventional growth mechanism of one dimensional nanowires. Then we provide a review about most widely used growth techniques, sample preparation and the cutting edge characterization techniques including advanced electron microscopy, in situ electron diffraction, micro-Raman spectroscopy, and atom probe tomography. In the end, the growth of different heteostructured III-V semiconductor nanowires will be reviewed. We will focus on the morphology dependence, temperature influence, and III/V flux ratio dependent growth. The perspective and an outlook of this field is discussed in order to foresee the future of the fundamental research and application of these one dimensional nanostructures.
引用
收藏
页码:51 / 91
页数:41
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