Nanopatterning of Si wafer surface using microphase-separated structure of block copolymer as wet etching mask

被引：0
|
作者：
Watanabe, R. [1 ]
Kamata, K. [1 ,2 ]
Iyoda, T. [1 ,2 ]
机构：
[1] Tokyo Inst Technol, Chem Res Lab, Midoriku, Yokohama, Kanagawa 2268503, Japan
[2] JST CREST, Kawaguchi, Saitama 3320012, Japan
来源：
MICROPROCESSES AND NANOTECHNOLOGY 2007, DIGEST OF PAPERS | 2007年
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D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：188 / 189
页数：2
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