Computational Requirements for OPC

被引：0
|
作者：
Spence, Chris [1 ]
Goad, Scott [2 ]
机构：
[1] AMD, 1050 Arques Ave, Sunnyvale, CA 94085 USA
[2] SEMATECH, Austin, TX 78741 USA
来源：
DESIGN FOR MANUFACTURABILITY THROUGH DESIGN-PROCESS INTEGRATION III | 2009年 / 7275卷
关键词：
Optical Proximity Correction (OPC); Mask Data Preparation (MDP); Resolution Enhancement Technique (RET); Hardware Acceleration (HA); Amdahl's law; DESIGN; LITHOGRAPHY;
D O I：
10.1117/12.813522
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
In this paper, we provide some data on the actual scaling of OPC runtime that we have experienced at AMD. We review the expected OPC requirements down to the 16 nm node and develop a model to predict the total CPU requirements to process a single chip design. We will also review the scalability of "hardware acceleration" under a variety of scenarios.
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页数：9
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