Top-Coat Dewetting for the Highly Ordered Lateral Alignment of Block Copolymer Microdomains in Thin Films

被引:19
|
作者
Yoon, Eunkyoung [1 ,2 ]
Kim, Eunjin [1 ]
Kim, Daeheum [2 ]
Son, Jeong Gon [1 ]
机构
[1] Korea Inst Sci & Technol, Photoelect Hybrids Res Ctr, Seoul 136791, South Korea
[2] Kwangwoon Univ, Dept Chem Engn, Seoul 139701, South Korea
关键词
ORIENTATION; NANOLITHOGRAPHY; GRAPHOEPITAXY; NANOSTRUCTURES; LAYER;
D O I
10.1002/adfm.201403046
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Extremely straight and laterally aligned cylindrical microdomains of block copolymer (BCP) films have been prepared by simply covering the BCP films with a top coat and dewetting the latter via thermal annealing to generate shear flow in the BCP underlayer. The polystyrene-block-polydimethylsiloxane microdomains are perfectly aligned with sunburst direction along the polyvinyl alcohol top-coat dewetting front from the nucleation point to the end of the dewetting front. This alignment is at least 150 mu m long and the aspect ratio is higher than 15 000: 1. Studying the morphologies obtained as a function of top-coat and BCP film thickness at various annealing temperatures, highly ordered BCP patterns are obtained for a wide range of shear rates, while higher (but not the highest) temperatures and thicker BCP films lead to more ordered microdomain patterns, because of increased polymer mobility and a reduced surface/interface effect. An imprinting process is also introduced to pattern top coats, which then provide selective control of the dewetting direction so that unidirectionally aligned BCP patterns can be created in specific areas.
引用
收藏
页码:913 / 919
页数:7
相关论文
共 50 条
  • [41] Side-chain-grafted random copolymer brushes as neutral surfaces for controlling the orientation of block copolymer microdomains in thin films
    In, Insik
    La, Young-Hye
    Park, Sang-Min
    Nealey, Paul F.
    Gopalan, Padma
    LANGMUIR, 2006, 22 (18) : 7855 - 7860
  • [42] Ordered reactive nanomembranes/nanotemplates from thin films of block copolymer supramolecular assembly
    Sidorenko, A
    Tokarev, I
    Minko, S
    Stamm, M
    JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2003, 125 (40) : 12211 - 12216
  • [43] Orientation Control of Block Copolymer Thin Films Placed on Ordered Nanoparticle Mono layers
    Kim, Taehee
    Wooh, Sanghyuk
    Son, Jeong Gon
    Char, Kookheon
    MACROMOLECULES, 2013, 46 (20) : 8144 - 8151
  • [44] A Pathway to Microdomain Alignment in Block Copolymer/Nanoparticle Thin Films under Electric Field
    Bae, Joonwon
    BULLETIN OF THE KOREAN CHEMICAL SOCIETY, 2014, 35 (09): : 2689 - 2693
  • [45] The effect of nanoparticle on microdomain alignment in block copolymer thin films under an electric field
    Joonwon Bae
    Seon Joo Park
    Oh Seok Kwon
    Jyongsik Jang
    Journal of Materials Science, 2014, 49 : 4323 - 4331
  • [46] The effect of nanoparticle on microdomain alignment in block copolymer thin films under an electric field
    Bae, Joonwon
    Park, Seon Joo
    Kwon, Oh Seok
    Jang, Jyongsik
    JOURNAL OF MATERIALS SCIENCE, 2014, 49 (12) : 4323 - 4331
  • [47] Shear-induced alignment in thin films of a sphere-forming block copolymer
    Angelescu, Dan E.
    Wu, Mingshaw W.
    Waller, Judith H.
    Chaikin, Paul M.
    Register, Richard A.
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2005, 230 : U4160 - U4161
  • [48] Highly-ordered nanoporous thin films from photocleavable block copolymers
    Zhao, Hui
    Gu, Weiyin
    Sterner, Elizabeth
    Russell, Thomas P.
    Coughlin, E. Bryan
    Theato, Patrick
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2012, 243
  • [49] Highly ordered block copolymers in thin films by unidirectional solvent processing techniques
    Tang, Chuanbing
    Hardy, Christopher G.
    Qiao, Yali
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2012, 244
  • [50] PMSE 468-Surface modification strategies to induce vertical orientation of block copolymer microdomains in thin films
    Shetty, Dhanuraj S.
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2006, 232 : 120 - 120