Synaptic behaviors and modeling of a metal oxide memristive device

被引:342
|
作者
Chang, Ting [1 ]
Jo, Sung-Hyun [1 ]
Kim, Kuk-Hwan [1 ]
Sheridan, Patrick [1 ]
Gaba, Siddharth [1 ]
Lu, Wei [1 ]
机构
[1] Univ Michigan, Dept Elect Engn & Comp Sci, Ann Arbor, MI 48109 USA
来源
基金
美国国家科学基金会;
关键词
RESISTANCE; ELEMENT; SYSTEMS; DRIFT;
D O I
10.1007/s00339-011-6296-1
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Nanoscale memristive devices using tungsten oxide as the switching layer have been fabricated and characterized. The devices show the characteristics of a flux-controlled memristor such that the conductance change is governed by the history of the applied voltage signals, leading to synaptic behaviors including long-term potentiation and depression. The memristive behavior is attributed to the migration of oxygen vacancies upon bias which modulates the interplay between Schottky barrier emission and tunneling at the WO (X) /electrode interface. A physical model incorporating ion drift and diffusion effects using an internal state variable representing the area of the conductive region has been proposed to explain the observed memristive behaviors. A SPICE model has been further developed that can be directly incorporated into existing circuit simulators. This type of device can be fabricated with low-temperature processes and has potential applications in synaptic computations and as analog circuit components.
引用
收藏
页码:857 / 863
页数:7
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