Effect of post-annealing on the magnetic properties of Bi: YIG film by RF magnetron sputtering on si substrates

被引：24

作者：

Yang, Qinghui ^{[1
]}

Zhang, Huaiwu ^{[1
]}

Liu, Yingli ^{[1
]}

Wen, Qiye ^{[1
]}

机构：

[1] Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China

来源：

IEEE TRANSACTIONS ON MAGNETICS | 2007年 / 43卷 / 09期

关键词：

Bi : YIG film; coercive force; recurrent rapid thermal annealing; RF magnetron sputtering; saturation magnetization;

D O I：

10.1109/TMAG.2007.900979

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We deposited amorphous Bi:YIG film on Si substrates by radio-frequency (RF) magnetron sputtering and crystallized it by the recurrent rapid thermal annealing (RRTA) method. We studied the effects of heating temperature on the crystallization, surface condition, and magnetic properties of the films using X-ray diffraction, an atomic force microscope, and a vibrating sample magnetometer. We also examined the effects of atmosphere and the recurrent-period on the films. Our results show that the RRTA method yields film with good magnetic properties, with saturation magnetization of 1750 Gs and coercive force of 80 Oe and good surface condition.

引用

页码：3652 / 3655

页数：4

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