Perturbation method for dielectric constant measurement of thick-film dielectric materials at microwave frequencies

被引:3
|
作者
Li, D
Free, CE
Pitt, KEG
Barnwell, PG
机构
[1] Middlesex Univ, London N11 2NQ, England
[2] Heraeus Inc, Cermalloy Div, W Conshohocken, PA 19428 USA
关键词
D O I
10.1049/el:19981392
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A novel technique, using a cavity perturbation method, for measuring the relative permittivity of dielectric thick-film materials is presented. Measurement data have been obtained at X-band frequencies for two kinds of dielectric thick-film material. The method combines simplicity with high accuracy and has the potential to measure films as thin as 20 mu m.
引用
收藏
页码:2042 / 2044
页数:3
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